V. Bakshi

Benchmarking of commercial software for fault detection and classification (FDC) of plasma etchers for semiconductor manufacturing equipment

V. Bakshi, 1997, Proceedings of the 1997 American Control Conference (Cat. No.97CH36041).

Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography

Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, 2005 .

Angle-resolved absolute out-of-band radiation studies of a tin-based laser-produced plasma source

Padraig Dunne, V. Bakshi, P. Hayden, 2007 .