F. Gaiseanu

Analysis of the defects induced by boron implantation in silicon after sequential annealing processes

R. Plugaru, F. Gaiseanu, M. Bazu, 1994, Proceedings of MELECON '94. Mediterranean Electrotechnical Conference.

Stress control for process optimization of the capacitive pressure sensors for biomedical applications achieved by surface micromachining technology

J. Esteve, D. Dascalu, F. Gaiseanu, 1998, 1998 International Semiconductor Conference. CAS'98 Proceedings (Cat. No.98TH8351).

Influence of the restructuring process on the phosphorus doping near the polysilicon/SiO/sub 2/ interface on silicon

D. Goustouridis, F. Gaiseanu, C. A. Dimitriadis, 1997, 1997 International Semiconductor Conference 20th Edition. CAS '97 Proceedings.

Chemical etching control during the self-limitation process by boron diffusion in silicon: Analytical results

J. Esteve, D. Goustouridis, F. Gaiseanu, 1997, 1997 International Semiconductor Conference 20th Edition. CAS '97 Proceedings.

Simulation of the misfit elastic stress induced by implanted impurities in semiconductor wafers

R. Plugaru, F. Gaiseanu, M. Bazu, 1994, Proceedings of MELECON '94. Mediterranean Electrotechnical Conference.