Plamen Tzviatkov

100-nm generation contact patterning by low temperature 193-nm resist reflow process

Frieda Van Roey, Kevin Lucas, Veerle Van Driessche, 2002, SPIE Advanced Lithography.

Resist reflow for 193-nm low-K1 lithography contacts

Kevin D. Lucas, Mireille Maenhoudt, Grozdan Grozev, 2003, SPIE Advanced Lithography.

Adjustment of bilayer optical properties and the effect on imaging and etching performance

John J. Biafore, Veerle Van Driessche, Grozdan Grozev, 2000, Advanced Lithography.

Low-temperature 193-nm resist reflow process for 100-nm generation contact patterning

Frieda Van Roey, Kevin Lucas, Veerle Van Driessche, 2001, Microelectronic and MEMS Technologies.