Thorsten Last

Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArFi and extreme ultraviolet lithography

Jo Finders, Laurens de Winter, Thorsten Last, 2016 .

Illumination pupil optimization in 0.33-NA extreme ultraviolet lithography by intensity balancing for semi-isolated dark field two-bar M1 building blocks

Jo Finders, Paul van Adrichem, Laurens de Winter, 2016 .

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Mark van de Kerkhof, Leon Levasier, Roderik van Es, 2017, Advanced Lithography.

Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics

Gijsbert Rispens, Jan van Schoot, Eelco van Setten, 2016, European Mask and Lithography Conference.

Contrast optimization for 0.33NA EUV lithography

Gijsbert Rispens, Jo Finders, Friso Wittebrood, 2016, SPIE Advanced Lithography.