M. N. Lyakhov

Evaluation of the dry resist octavinylsilsesquioxan and its application to three-dimensional electron-beam lithography

Hans W. P. Koops, M. Weber, A. Holopkin, 1996, Advanced Lithography.

Investigation of new dry high sensitive resist using 100 kV electron lithography

K. A. Valiev, E. N. Zhikharev, A. Holopkin, 1994 .

Evaluation of the dry resist Vinyl-T8 and its application to optical microlenses

M. N. Lyakhov, H. Koops, G. Dahm, 1996 .