Michael Goss

发表

Introduction of pre-etch deposition techniques in EUV patterning

John Arnold, Lei Sun, Dominik Metzler, 2018, Advanced Lithography.

450mm etch process development and process chamber evaluation using 193i DSA guided pattern

George Stojakovic, James Paris, Mark Kelling, 2016, SPIE Advanced Lithography.

Plasma etch challenges with new EUV lithography material introduction for patterning for MOL and BEOL

John Arnold, Peng Wang, Yann Mignot, 2015, Advanced Lithography.

Development of a risk-based index for source water protection planning, which supports the reduction of pathogens from agricultural activity entering water resources.

Michael Goss, M. Goss, C. Richards, 2008, Journal of environmental management.