M. Torkler

Novel surface imaging process with ion-beam lithography and dry development

Ulrich A. Jagdhold, Wolfgang Pilz, L. M. Buchmann, 1992, Advanced Lithography.

Nanocomposite resist systems for next generation lithography

Wei He, Marie Angelopoulos, Wu-Song Huang, 2002 .

Measuring acid generation efficiency in chemically amplified resists with all three beams

Hans Loeschner, Robert L. Brainard, Rainer Kaesmaier, 1999 .

Chemically amplified deep ultraviolet resist for positive tone ion exposure

M. Torkler, W. H. Bruenger, M. Torkler, 1997 .

Resolution improvement of ion projector with a low energy spread multicusp ion source

Hans Loeschner, Ivo W. Rangelow, Ka-Ngo Leung, 1999 .

Fabrication of 3.5 GHz surface acoustic wave filters by ion projection lithography

M. Kreutzer, G. Zwicker, M. Torkler, 1992 .

Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices

Ivo W. Rangelow, Ka-Ngo Leung, Hans Loschner, 1999 .