K. W. Rhee

发表

Feasibility Study of Micro-undulator for T-ray Light Source Using FEM

P. W. Jang, K. W. Rhee, 2007 .

Sub-40-nm pattern replication with +/- 20% process latitude by soft-contact x-ray lithography

David Carter, Henry I. Smith, K. W. Rhee, 1999, Advanced Lithography.

Comparison of dry-etch approaches for tungsten patterning

Martin C. Peckerar, K. W. Rhee, Orest J. Glembocki, 1994, Advanced Lithography.

Nanolithography with Electron Beams: Theory and Practice

Martin C. Peckerar, K. W. Rhee, C. R. K. Marrian, 2002 .

Thin silicon nitride films to increase resolution in e-beam lithography

Mario G. Ancona, Martin C. Peckerar, K. W. Rhee, 1993, Advanced Lithography.

Recent progress on photon-counting superconducting detectors for submillimeter astronomy

Mary J. Li, Thomas R. Stevenson, Carl M. Stahle, 2003, SPIE Astronomical Telescopes + Instrumentation.

Comparative mobility degradation in modulation‐doped GaAs devices after e‐beam and x‐ray irradiation

Dimitri A. Antoniadis, Michael R. Melloch, Martin C. Peckerar, 1992 .

Sub-0.1 μ electron-beam lithography for nanostructure development

Martin C. Peckerar, K. W. Rhee, M. Peckerar, 2000 .

An error measure for dose correction in e‐beam nanolithography

A. Teolis, Martin C. Peckerar, K. W. Rhee, 1990 .

Patterning tungsten films with an electron beam lithography system at 50 keV for x-ray mask applications

Martin C. Peckerar, K. W. Rhee, J. M. Andrews, 1991 .

Modeling of electron elastic and inelastic scattering

Martin C. Peckerar, K. W. Rhee, Christie R. K. Marrian, 1996 .

Reactive ion etching of high‐aspect‐ratio 100 nm linewidth features in tungsten

Martin C. Peckerar, K. W. Rhee, William Chu, 1994 .

Imaging layers for 50 kV electron beam lithography: Selective displacement of noncovalently bound amine ligands from a siloxane host film

Mu-San Chen, K. W. Rhee, Walter J. Dressick, 2001 .