Bernd Weyrauch

A novel electron-beam-based photomask repair tool

Petra Spies, Klaus Edinger, Hans Becht, 2003, SPIE Photomask Technology.

Application of electron-beam-induced processes to mask repair

Hans W. P. Koops, Klaus Edinger, Michael Budach, 2003, Photomask Japan.

Electron-beam Induced Processes and their Applicability to Mask Repair

Rudolf Schmidt, Hans W. P. Koops, Klaus Edinger, 2002, Photomask Technology.

Electron-beam-based photomask repair

Hans W. P. Koops, Petra Spies, Klaus Edinger, 2004 .