Rich Wise

EUV line-space pattern defect mitigation simulation using Coventor SEMulator3D to enable exposure dose reduction

Nader Shamma, Yang Pan, David Fried, 2019, Advanced Lithography.

A New Etch Planarization Technology to Correct Non-Uniformity Post Chemical Mechanical Polishing

Harmeet Singh, Meihua Shen, Rich Wise, 2015, IEEE Transactions on Semiconductor Manufacturing.