Tsai-Sheng Gau

发表

OCD metrology by floating n/k

Burn J. Lin, Anthony Yen, Shinn-Sheng Yu, 2007, SPIE Advanced Lithography.

Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments

Anthony Yen, Tsai-Sheng Gau, Burn Jeng Lin, 2002, SPIE Advanced Lithography.

Quality indicators of image-based overlay

Yen-Liang Chen, Jacky Huang, Chih-Ming Ke, 2012, Advanced Lithography.

Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Wenge Yang, Chih-Ming Ke, Tsai-Sheng Gau, 2003, SPIE Advanced Lithography.

Pattern-dependence optical phase effect on alternating phase shift mask

Tsai-Sheng Gau, Jaw-Jung Shin, Bin-Chang Chang, 2003, Photomask Japan.

Mask polarization effects in hyper NA systems

Tsai-Sheng Gau, Chun-Kuang Chen, Burn J. Lin, 2004, SPIE Advanced Lithography.

General scaling law of optical lithography optical theory

Anthony Yen, Tsai-Sheng Gau, Chun-Kuang Chen, 2004, SPIE Advanced Lithography.

Multiple-image-depth modeling for hotspot and AF printing detections

Tsai-Sheng Gau, Wen-Chun Huang, Yu-Po Tang, 2012, Advanced Lithography.

Alt-PSM of Contact with Phase Assist Feature for 65-nm Node

Burn Jeng Lin, Tsai-Sheng Gau, Chung-Hsing Chang, 2002, Photomask Technology.

Overlay and focus stability control for 28-nm nodes on immersion scanners

Albert Chen, Tsai-Sheng Gau, Jim Chen, 2011, Advanced Lithography.

Inverse polarizer on immersion lithography mask

Minfeng Chen, Tsai-Sheng Gau, Chun-Kuang Chen, 2016, Advanced Lithography.

90-nm lithography process characterization using ODP scatterometry technology

Wenge Yang, Jacky Huang, Chih-Ming Ke, 2004, SPIE Advanced Lithography.

Study of line edge roughness using continuous wavelet transform for 65-nm node

Tsai-Sheng Gau, Chun-Kuang Chen, Burn-Jeng Lin, 2004, SPIE Advanced Lithography.

Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Burn J. Lin, Tsai-Sheng Gau, Jaw-Jung Shin, 2004, Photomask Japan.

Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

Tsai-Sheng Gau, Chun-Kuang Chen, Li-Jui Chen, 2007, SPIE Advanced Lithography.

Detection of lateral CD shift with scatterometry on grating structures in production layout

Jacky Huang, Chih-Ming Ke, Tsai-Sheng Gau, 2010, Advanced Lithography.

Reduction of image-based ADI-to-AEI overlay inconsistency with improved algorithm

Yen-Liang Chen, Chih-Ming Ke, Tsai-Sheng Gau, 2013, Advanced Lithography.

Resist profile simulation with fast lithography model

Tsai-Sheng Gau, Wen-Chun Huang, Yu-Po Tang, 2014, Advanced Lithography.

Evaluation of line and hole measurement by high-resolution low-magnification CD SEM

Hiroki Kawada, Takashi Iizumi, Chih-Ming Ke, 2005, SPIE Advanced Lithography.

Simulation of AIMS measurements using rigorous mask 3D modeling

Tsai-Sheng Gau, Ru-Gun Liu, Hsu-Ting Huang, 2015, Advanced Lithography.

Immersion defect reduction, part I: analysis of water leaks in an immersion scanner

Burn Jeng Lin, Tsai-Sheng Gau, Chun-Kuang Chen, 2007, SPIE Advanced Lithography.

Customized illumination aperture filter for low k1 photolithography process

Tsai-Sheng Gau, Chun-Kuang Chen, Ru-Gun Liu, 2000, Advanced Lithography.

Optimal positions for SB assignment and the specification of SB width variation

Tsai-Sheng Gau, Ru-Gun Liu, Chih-Ming Lai, 2001, SPIE Advanced Lithography.

Mask error tensor and causality of mask error enhancement for low- k 1 imaging: theory and experiments

Anthony Yen, Tsai-Sheng Gau, Jaw-Jung Shin, 2004 .

Novel 20nm hybrid SOI/bulk CMOS technology with 0.183/spl mu/m/sup 2/ 6T-SRAM cell by immersion lithography

Tsai-Sheng Gau, Jaw-Jung Shin, Chien-Chao Huang, 2005, Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005..

A 65nm node strained SOI technology with slim spacer

Chenming Hu, Tsai-Sheng Gau, Yee-Chia Yeo, 2003, IEEE International Electron Devices Meeting 2003.

Image characterization of bubbles in water for 193-nm immersion lithography—far-field approach

Tsai-Sheng Gau, Chun-Kuang Chen, Burn-Jeng Lin, 2004 .

45nm node planar-SOI technology with 0.296 /spl mu/m/sup 2/ 6T-SRAM cell

Chenming Hu, Tsai-Sheng Gau, Jaw-Jung Shin, 2004, Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004..

Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles

Burn Jeng Lin, Anthony Yen, Chih-Ming Ke, 2005 .