Michael L. Rieger

发表

Communication theory in optical lithography

Michael L. Rieger, 2012 .

Using behavior modeling for proximity correction

Michael L. Rieger, John P. Stirniman, 1994, Advanced Lithography.

Mathematically describing the target contour in silicon such that model-based OPC can best realize design intent

Michael L. Rieger, Christopher Cork, Pratheep Balasingam, 2004, SPIE Advanced Lithography.

Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process

Michael L. Rieger, Alexander V. Tritchkov, Shane R. Palmer, 2001, SPIE Photomask Technology.

Mask cost reduction and yield optimization using design intent

Michael L. Rieger, Michel Luc Côté, Alexander Miloslavsky, 2005, SPIE Advanced Lithography.

Quantifying proximity and related effects in advanced wafer processes

Michael L. Rieger, John P. Stirniman, Robert E. Gleason, 1995, Advanced Lithography.

Programmable RET Mask Layout Verification

Zongwu Tang, Michael L. Rieger, Daniel F. Beale, 2002, Photomask Technology.

Design for Manufacturability through Design-Process Integration III

Michael L. Rieger, Vivek Kumar Singh, 2008 .

Understanding the parameters for strong phase-shift mask lithography

Alexander Tritchkov, Michael L. Rieger, John P. Stirniman, 2000, Advanced Lithography.

Model-based interpretation filtering for complex two-dimensional layout features

Lawrence S. Melvin, James P. Shiely, Michael L. Rieger, 2004, Photomask Japan.

Litho variations and their impact on the electrical yield of a 32nm node 6TSRAM cell design for manufacturability through design-proces integration II

Geert Vandenberghe, Wim Dehaene, Staf Verhaegen, 2008 .

Retrospective on VLSI value scaling and lithography

Michael L. Rieger, 2019 .

Verifying RET mask layouts

James P. Shiely, Zongwu Tang, Michael L. Rieger, 2002, SPIE Advanced Lithography.

Multiple-stage optical proximity correction

James P. Shiely, Michael L. Rieger, Daniel F. Beale, 2003, SPIE Advanced Lithography.

Process centering OPC using design intent to improve yield

Robert Lugg, Michael L. Rieger, Michel Luc Côté, 2005, SPIE Advanced Lithography.

A methodology to calculate line-end correction feature performance as a function of reticle cost

Lawrence S. Melvin, James P. Shiely, Michael L. Rieger, 2003, SPIE Advanced Lithography.

Maintaining lithographic quality during OPC for low k1 and MEEF processes constrained by mask dimensional rules

Lawrence S. Melvin, Mike Miller, Robert Lugg, 2004, SPIE Photomask Technology.

Anticipating and controlling mask costs within EDA physical design

Lawrence S. Melvin, Robert Lugg, Michael L. Rieger, 2003, Photomask Japan.

An Effective Distributed Architecture for OPC & RET Applications

Robert Lugg, Michael L. Rieger, Mathias Boman, 2002, Photomask Technology.

Phase-shift mask applications

Michael L. Rieger, Peter D. Buck, 1991, Other Conferences.

Optical proximity effects correction at 0.25 um incorporating process variations in lithography

Geert Vandenberghe, Kurt G. Ronse, Luc Van den Hove, 1997, Advanced Lithography.

Optimizing proximity correction for wafer fabrication processes

Michael L. Rieger, John P. Stirniman, 1994, Photomask Technology.

OPC strategies to minimize mask cost and writing time

James P. Shiely, Michael L. Rieger, Jiangwei Li, 2002, SPIE Photomask Technology.

Fast proximity correction with zone sampling

Michael L. Rieger, John P. Stirniman, M. Rieger, 1994, Advanced Lithography.

Adaptive OPC with a conformal target layout

Robert Lugg, Michael L. Rieger, Daniel F. Beale, 2002, SPIE Advanced Lithography.

Enriching design intent for optimal OPC and RET

Robert Lugg, Michael L. Rieger, Daniel F. Beale, 2002, Photomask Japan.

Customizing proximity correction for process-specific objectives

Michael L. Rieger, John P. Stirniman, 1996, Advanced Lithography.

Layout design methodolgies for sub-wavelength manufacturing

Michael L. Rieger, Jeffrey P. Mayhew, Sridhar Panchapakesan, 2001, DAC '01.

Classical control theory applied to OPC correction segment convergence

Michael L. Rieger, Benjamin D. Painter, Lawrence L. Melvin, 2004, SPIE Advanced Lithography.

Lithographic alternatives to PSM repair

Michael L. Rieger, Peter D. Buck, Mark Shaw, 1992, Advanced Lithography.

Spatial-filter models to describe IC lithographic behavior

Michael L. Rieger, John P. Stirniman, 1997, Advanced Lithography.

Model-based methodology for reducing OPC output pattern complexity

Lawrence S. Melvin, Michael L. Rieger, 2003, SPIE Photomask Technology.

Alternating PSM optimization using model-based OPC

Alexander Tritchkov, Michael L. Rieger, John P. Stirniman, 1999, Advanced Lithography.

Mask fabrication rules for proximity-corrected patterns

Michael L. Rieger, John P. Stirniman, 1996, Photomask Technology.

Placing assist features in layout using a process model

Lawrence S. Melvin, James P. Shiely, Michael L. Rieger, 2004, SPIE Photomask Technology.

Specifying phase-shift mask image quality parameters

Michael L. Rieger, Peter D. Buck, 1992, Other Conferences.

Advanced model formulations for optical and process proximity correction

James P. Shiely, Michael L. Rieger, Daniel F. Beale, 2004, SPIE Advanced Lithography.