Douglas J. Van Den Broeke

发表

Through-pitch low-k1 contact hole imaging with CPL technology

Vincent Wiaux, Geert Vandenberghe, Kurt G. Ronse, 2004, Photomask Japan.

Investigation of phase variation impact on CPL PSM for low k1 imaging

Stephen D. Hsu, Douglas J. Van Den Broeke, Chun-hung Lin, 2003, Photomask Japan.

Contact hole reticle optimization by using interference mapping lithography (IML)

Will Conley, J. Fung Chen, Stephen D. Hsu, 2004, SPIE Advanced Lithography.

CPL mask technology for sub-100-nm contact hole imaging

Kevin D. Lucas, Christopher J. Progler, J. Fung Chen, 2004, Photomask Japan.

New resolution enhancement technology for manufacturing sub-100-nm technology

Dong-Hoon Chung, In-Gyun Shin, Seong-Woon Choi, 2002, SPIE Advanced Lithography.

Application of Chromeless Phase Lithography (CPL) masks in ArF lithography

Will Conley, Christopher J. Progler, Robert J. Socha, 2002, Photomask Technology.

Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)

John S. Petersen, Stephen Hsu, Robert J. Socha, 2002, SPIE Advanced Lithography.

Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Will Conley, John S. Petersen, David J. Gerold, 2002, SPIE Advanced Lithography.

Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography

Martin McCallum, John S. Petersen, J. Fung Chen, 1998, Photomask and Next Generation Lithography Mask Technology.

RET integration of CPL technology for random logic

Will Conley, J. Fung Chen, Stephen D. Hsu, 2004, SPIE Advanced Lithography.

ArF solutions for low-k1 back-end imaging

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Manufacturing an advanced process characterization reticle incorporating halftone biasing

Kent H. Nakagawa, J. Fung Chen, Douglas J. Van Den Broeke, 1999, European Mask and Lithography Conference.

Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems

Kent H. Nakagawa, J. Fung Chen, Robert J. Socha, 1999, Photomask and Next Generation Lithography Mask Technology.

Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL)

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, SPIE Advanced Lithography.

Study of dry etching pattern profile of chromeless phase lithography (CPL) mask

J. Fung Chen, Stephen D. Hsu, Douglas J. Van Den Broeke, 2003, SPIE Photomask Technology.

Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC

Ting Chen, Stephen D. Hsu, Robert J. Socha, 2004, SPIE Advanced Lithography.

Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)

Robert Socha, Stephen D. Hsu, Douglas J. Van Den Broeke, 2003, SPIE Photomask Technology.

Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology

Will Conley, John S. Petersen, Donis G. Flagello, 2002, SPIE Advanced Lithography.

Improved PBS process for e-beam photomask lithography

Douglas J. Van Den Broeke, Wayne P. Shen, James W. Marra, 1996, Photomask Technology.

Double dipole lithography for 65-nm node and beyond: a technology readiness review

Tsann-Bim Chiou, Jo Finders, Eric Hendrickx, 2004, Photomask Japan.

Eigen-decomposition-based models for model OPC

J. Fung Chen, Stephen D. Hsu, Douglas J. Van Den Broeke, 2004, Photomask Japan.

Reticle defect printability for sub-0.3k1 chromeless phase lithography (CPL) technology

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Japan.

CD error sensitivity to "sub-killer" defects at k1 near 0.4: II

Kent H. Nakagawa, J. Fung Chen, Robert J. Socha, 1999, Photomask Technology.

OPC technology road map to 0.14-μm design rules

J. Fung Chen, Douglas J. Van Den Broeke, Kurt E. Wampler, 1997, Photomask Technology.

Defect printability in CPL mask technology

Will Conley, Christopher J. Progler, Robert J. Socha, 2004, SPIE Advanced Lithography.

Development of mask-making process for CLM manufacturing technology

Dong-Hoon Chung, Seong-Woon Choi, Jung-Min Sohn, 2002, Photomask Japan.

Tuning MEEF for CD control at 65nm node based on Chromeless Phase Lithography (CPL)

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Technology.

Contact hole reticle optimization by using interference mapping lithography (IML)

Stephen D. Hsu, Robert J. Socha, Douglas J. Van Den Broeke, 2004, Photomask Japan.

65-nm full-chip implementation using double dipole lithography

Will Conley, Tsann-Bim Chiou, Jo Finders, 2003, SPIE Advanced Lithography.

Low k1 lithography patterning option for the 90-nm and 65-nm nodes

J. Fung Chen, Stephen D. Hsu, Douglas J. Van Den Broeke, 2003, Photomask Japan.

Inspection of chromeless AAPSM

Darren Taylor, J. Fung Chen, Douglas J. Van Den Broeke, 2002, SPIE Advanced Lithography.

Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Will Conley, John S. Petersen, David J. Gerold, 2002, SPIE Advanced Lithography.

CPL reticle technology for advanced device applications

Kevin D. Lucas, Philippe Thony, Christopher J. Progler, 2004, Photomask Japan.

Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography

Jung-Min Sohn, Sung-Woon Choi, J. Fung Chen, 2003, SPIE Photomask Technology.

Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node

J. Fung Chen, Stephen D. Hsu, Robert J. Socha, 2004, Photomask Japan.

Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL

J. Fung Chen, Stephen D. Hsu, Douglas J. Van Den Broeke, 2004, Photomask Japan.

Phase defect repair for the chromeless phase lithography (CPL) mask

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Technology.

CD error sensitivity to "sub-killer" defects at k1 near 0.4

Kent H. Nakagawa, J. Fung Chen, Robert J. Socha, 1999, Advanced Lithography.

Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Japan.

Mesa or Trench Type for Chromeless Phase-shift Lithography From Photolithographic Performance Point of View

Stephen Hsu, J. Fung Chen, Robert J. Socha, 2002, Photomask Technology.

The application of CPL reticle technology for the 0.045-mm node

Will Conley, Kevin D. Lucas, Fung Chen, 2004, SPIE Advanced Lithography.

Application of CPL reticle technology for the 65- and 50-nm node

Douglas J. Van Den Broeke, Kurt E. Wampler, Thomas L. Laidig, 2003, SPIE Advanced Lithography.

Resist model calibration using 2D developed patterns for low-k1 process optimization and wafer printing predictions

Ting Chen, Linda Yu, Stephen Hsu, 2004, SPIE Photomask Technology.

Application challenges with double patterning technology (DPT) beyond 45 nm

Vincent Wiaux, Geert Vandenberghe, Jo Finders, 2006, SPIE Photomask Technology.