John L. Staples

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Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS

Derek B. Dove, Russell A. Budd, John L. Staples, 1997, IBM J. Res. Dev..

New mask evaluation tool: the microlithography simulation microscope aerial image measurement system

Derek B. Dove, Russell A. Budd, John L. Staples, 1994, Advanced Lithography.

New tool for phase-shift mask evaluation: the stepper equipment aerial image measurement system--AIMS

Derek B. Dove, Russell A. Budd, John L. Staples, 1994, Photomask Technology.

Application of an aerial image measurement system to mask fabrication and analysis

Lars W. Liebmann, Derek B. Dove, Russell A. Budd, 1994, Photomask Technology.

Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS : Optical lithography

Derek B. Dove, Russell A. Budd, John L. Staples, 1997 .

A 10.5-in.-diagonal SXGA active-matrix display

Steven L. Wright, Yue Kuo, Frank R. Libsch, 1998, IBM J. Res. Dev..

Microbial identification system for Space Station Freedom

John L. Staples, Harlan D. Brown, Duane L. Plerson, 1989 .

Application of the aerial image measurement system (AIMS)TM to the analysis of binary mask imaging and resolution enhancement techniques

Lars W. Liebmann, Derek B. Dove, Richard A. Ferguson, 1994, Advanced Lithography.

Continuous Microwave Oscillations of Current in GaAs

John L. Staples, Norman Braslau, John Battiscombe Gunn, 1964, IBM J. Res. Dev..