Sophie Peng

A sophisticated metrology solution for advanced lithography: addressing the most stringent needs of today as well as future lithography

Noelle Wright, Maurits van der Schaar, Sophia Wang, 2009, Lithography Asia.

A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography

Noelle Wright, Maurits van der Schaar, Sophia Wang, 2010, Advanced Lithography.

Litho process control via optimum metrology sampling while providing cycle time reduction and faster metrology-to-litho turn around time

Albert Li, Maurits van der Schaar, Kaustuve Bhattacharyya, 2011, Advanced Lithography.