Thomas M. Gairing

Improved baking of photomasks by a dynamically zone-controlled process approach

Peter Dress, Thomas M. Gairing, Werner Saule, 2001, Photomask Japan.

CD performance of CA-resits with dynamically controlled multizone bake system

Naoya Hayashi, Hiroshi Mohri, Shiho Sasaki, 2002, European Mask and Lithography Conference.