Uwe U. Dietze

Improved baking of photomasks by a dynamically zone-controlled process approach

Peter Dress, Thomas M. Gairing, Werner Saule, 2001, Photomask Japan.

STEAG HamaTech Resist Coater ASR5000 - tool concept and process results -

Mathias Irmscher, Corinna Koepernik, Peter Voehringer, 2002, Photomask Technology.