M. von Haartman

Low-frequency noise in Si0.7Ge0.3 surface channel pMOSFETs with ALD HfO2/Al2O3 gate dielectrics

Mikael Östling, Bengt Gunnar Malm, Per-Erik Hellström, 2004 .

Ni-salicided CMOS with a poly-SiGe/Al2O3/HfO2/Al2O3 gate stack

Mikael Östling, S.-L. Zhang, Per-Erik Hellström, 2005 .

Lateral encroachment of Ni-silicides in the source/drain regions on ultrathin silicon-on-insulator

Mikael Östling, Bengt Gunnar Malm, S.-L. Zhang, 2005 .

Low-frequency noise in SiGe channel pMOSFETs on ultra-thin body SOI with Ni-silicided source/drain

Mikael Östling, Bengt Gunnar Malm, P.-E. Hellstrom, 2005 .

Impact of strain and channel orientation on the low-frequency noise performance of Si n- and pMOSFETs

Mikael Östling, Bengt Gunnar Malm, Evan H. C. Parker, 2007 .

1/f noise in Si and Si/sub 0.7/Ge/sub 0.3/ pMOSFETs

Mikael Östling, Bengt Gunnar Malm, Shi-Li Zhang, 2003 .