S. Biesemans

Single exposure EUV of 32nm pitch logic structures: patterning performance on BF and DF masks

E. Hendrickx, M. Kupers, J. Bekaert, 2018, Advanced Lithography.

EUV pupil optimization for 32nm pitch logic structures

E. Hendrickx, M. Dusa, K. Nafus, 2018, Photomask Technology.

Optimization of HfSiON using a design of experiment (DOE) approach on 0.45 V Vt Ni-FUSI CMOS transistors

Anabela Veloso, Olivier Richard, I. Debusschere, 2007, Microelectron. Reliab..