Koji Eriguchi

发表

A new aspect of plasma-induced physical damage in three-dimensional scaled structures — Sidewall damage by stochastic straggling and sputtering

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2014, 2014 IEEE International Conference on IC Design & Technology.

Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics

Takayuki Yamada, Koji Eriguchi, Masaru Moriwaki, 2001, Microelectron. Reliab..

P2ID 2002 industry survey of semiconductor process-induced damage

Koji Eriguchi, Thuy B. Dao, Terence Hook, 2003, 2003 8th International Symposium Plasma- and Process-Induced Damage..

Atomistic simulations of plasma process-induced Si substrate damage - Effects of substrate bias-power frequency

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2013, Proceedings of 2013 International Conference on IC Design & Technology (ICICDT).

Plasma-Induced Transconductance Degradation of nMOSFET with Thin Gate Oxide

Koji Eriguchi, Masatoshi Arai, Yukiharu Uraoka, 1995 .

Impacts of strained SiO/sub 2/ on TDDB lifetime projection

Koji Eriguchi, Yoshinao Harada, Takanobu Watanabe, 2000, 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104).

Effects of base layer thickness on reliability of CVD Si3N4 stack gate dielectrics

Koji Eriguchi, Masaaki Niwa, Yoshinao Harada, 2001, Microelectron. Reliab..

Evaluation technique of gate oxide damage

Koji Eriguchi, Yukiharu Uraoka, Kazuhiko Tsuji, 1993, ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures.

Surface orientation dependence of ion bombardment damage during plasma processing

Koji Eriguchi, Kouichi Ono, Yukimasa Okada, 2015, 2015 International Conference on IC Design & Technology (ICICDT).

Impacts of plasma process-induced damage on MOSFET parameter variability and reliability

Koji Eriguchi, Kouichi Ono, 2015, Microelectron. Reliab..

Reliability projecting for ReRAM based on stochastic differential equation

Yukio Hayakawa, Takumi Mikawa, Koji Eriguchi, 2016, 2016 13th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT).

Optimization problems for plasma-induced damage - A concept for plasma-induced damage design

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2012, 2012 IEEE International Conference on IC Design & Technology.

Evaluation of Plasma Damage to Gate Oxide (Special Issue on Quarter Micron Si Device and Process Technologies)

Koji Eriguchi, Yukiharu Uraoka, Kazuhiko Tsuji, 1994 .

Random telegraph noise as a new measure of plasma-induced charging damage in MOSFETs

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2014, 2014 IEEE International Conference on IC Design & Technology.

Plasma-induced photon irradiation damage on low-k dielectrics enhanced by Cu-line layout

Koji Eriguchi, Kouichi Ono, Taro Ikeda, 2015, 2015 International Conference on IC Design & Technology (ICICDT).

Evaluation methodology for assessment of dielectric degradation and breakdown dynamics using time-dependent impedance spectroscopy (TDIS)

Koji Eriguchi, Tomohiro Kuyama, Keiichiro Urabe, 2021, 2021 IEEE International Reliability Physics Symposium (IRPS).

Modeling of ion-bombardment damage on Si surfaces for in-line analysis

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2010 .

Comprehensive Modeling of Threshold Voltage Variability Induced by Plasma Damage in Advanced Metal-Oxide-Semiconductor Field-Effect Transistors

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2010 .

Characterization of Plasma Process-Induced Latent Defects in Surface and Interface Layer of Si Substrate

Koji Eriguchi, Kouichi Ono, Yoshinori Nakakubo, 2015 .

Numerical and experimental study of microwave-excited microplasma and micronozzle flow for a microplasma thruster

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2009 .

Selective Etching of High-k Dielectric HfO2 Films over Si in BCl3-Containing Plasmas without rf Biasing

Koji Eriguchi, Kouichi Ono, Daisuke Hamada, 2009 .

Microwave-excited microplasma thruster: a numerical and experimental study of the plasma generation and micronozzle flow

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2008 .

Field and polarity dependence of time-to-resistance increase in Fe–O films studied by constant voltage stress method

Koji Eriguchi, Kouichi Ono, Hiroaki Ohta, 2009 .

Microplasma thruster for ultra-small satellites: Plasma chemical and aerodynamical aspects

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2008 .

An interatomic potential model for molecular dynamics simulation of silicon etching by Br+-containing plasmas

Koji Eriguchi, Kouichi Ono, Hiroaki Ohta, 2008 .

Microwave-excited microplasma thruster with helium and hydrogen propellants

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2011 .

Bias frequency dependence of pn junction charging damage induced by plasma processing

Koji Eriguchi, Kouichi Ono, Yoshinori Nakakubo, 2010 .

Effects of plasma-induced charging damage on random telegraph noise in metal–oxide–semiconductor field-effect transistors with SiO2 and high-k gate dielectrics

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2014 .

Evaluation technique of gate oxide damage

Koji Eriguchi, Yukiharu Uraoka, Tokuhiko Tamaki, 1994 .

Comparative Study of Plasma Source-Dependent Charging Polarity in Metal–Oxide–Semiconductor Field Effect Transistors with High-k and SiO2 Gate Dielectrics

Koji Eriguchi, Kouichi Ono, Daisuke Hamada, 2008 .

Effects of strained layer near SiO2–Si interface on electrical characteristics of ultrathin gate oxides

Koji Eriguchi, Masaaki Niwa, Yoshinao Harada, 2000 .

TDDB lifetime enhancement of high-k MOSFETs damaged by plasma processing — Conflicting results in plasma charging damage evaluation

Koji Eriguchi, Kouichi Ono, Masayuki Kamei, 2014, 2014 IEEE International Integrated Reliability Workshop Final Report (IIRW).

Model for Bias Frequency Effects on Plasma-Damaged Layer Formation in Si Substrates

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2010 .

Quantitative and comparative characterizations of plasma process-induced damage in advanced metal-oxide-semiconductor devices

Koji Eriguchi, Kouichi Ono, K. Eriguchi, 2008 .

Microwave-excited Microplasma Thruster with Applied Magnetic Field

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2011 .

Trade-Off Relationship between Si Recess and Defect Density Formed by Plasma-Induced Damage in Planar Metal–Oxide–Semiconductor Field-Effect Transistors and the Optimization Methodology

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2011, Japanese Journal of Applied Physics.

Modeling of plasma-induced damage and its impacts on parameter variations in advanced electronic devices

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2011 .

Correlation between two time-dependent dielectric breakdown measurements for the gate oxides damaged by plasma processing

Koji Eriguchi, Y. Kosaka, 1998 .

A miniature electrothermal thruster using microwave-excited microplasmas: Thrust measurement and its comparison with numerical analysis

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2007 .

Temperature and stress polarity-dependent dielectric breakdown in ultrathin gate oxides

Koji Eriguchi, Masaaki Niwa, 1998 .

Impact of Structural Strained Layer near SiO2/Si Interface on Activation Energy of Time-Dependent Dielectric Breakdown

Koji Eriguchi, Masaaki Niwa, Yoshinao Harada, 2000 .

Plasma Diagnostics and Thrust Performance Analysis of a Microwave-Excited Microplasma Thruster

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2006 .

Comparative Study of Plasma-Charging Damage in High-$k$ Dielectric and p--n Junction and Their Effects on Off-State Leakage Current of Metal--Oxide--Semiconductor Field-Effect Transistors

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2011 .

International Conference on IC Design & Technology

Koji Eriguchi, Jen-Shiun Chiang, Kimiyoshi Usami, 2008 .

An Improvement of Stillinger–Weber Interatomic Potential Model for Reactive Ion Etching Simulations

Koji Eriguchi, Kouichi Ono, Hiroaki Ohta, 2009 .

Correlating Charge-to-Breakdown with Constant-Current Injection to Gate Oxide Lifetime under Constant-Voltage Stress

Koji Eriguchi, Yukiharu Uraoka, 1996 .

Quantitative Evaluation of Gate Oxide Damage during Plasma Processing Using Antenna-Structure Capacitors

Koji Eriguchi, Noboru Nomura, Yukiharu Uraoka, 1994 .

Effects of straggling of incident ions on plasma-induced damage creation in “fin”-type field-effect transistors

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2014 .

A new prediction model for effects of plasma-induced damage on parameter variations in advanced LSIs

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2011, 2011 IEEE International Conference on IC Design & Technology.

Analytic Model of Threshold Voltage Variation Induced by Plasma Charging Damage in High-k Metal-Oxide-Semiconductor Field-Effect Transistor

Koji Eriguchi, Yoshinori Takao, Kouichi Ono, 2011 .