Mosong Cheng

发表

LAVA web-based remote simulation: enhancements for education and technology innovation

Sang Il Lee, Ka Chun Ng, Takashi Orimoto, 2001, SPIE Advanced Lithography.

Effects of residual aberrations on line-end shortening in 193-nm lithography

Andrew R. Neureuther, Mosong Cheng, 2002, SPIE Advanced Lithography.

Layout modification for library cell Alt-PSM composability

Mosong Cheng, Ke Cao, Jiang Yong Hu, 2004, SPIE Advanced Lithography.

Mosong Cheng, Rajesh Garg, Salman Gopalani, 2009, Proceedings of the 2009 12th International Symposium on Integrated Circuits.

Wire Sizing and Spacing for Lithographic Printability and Timing Optimization

Mosong Cheng, Jiang Hu, Ke Cao, 2007, IEEE Transactions on Very Large Scale Integration (VLSI) Systems.

Nanoscale detection of bacteriophage triggered ion cascade (Invited Paper)

Mosong Cheng, Laszlo B. Kish, Maria Dobozi-King, 2005, SPIE International Symposium on Fluctuations and Noise.

Methodology for modeling and simulating line-end shortening effects in deep-UV resist

Mosong Cheng, Ebo H. Croffie, Andrew R. Neureuther, 1999, Advanced Lithography.

Three-dimensional post-exposure modeling and its applications

Lei Yuan, Mosong Cheng, Ebo H. Croffie, 2001, SPIE Advanced Lithography.

Wire sizing and spacing for lithographic printability optimization

Mosong Cheng, Jiang Hu, Ke Cao, 2007, SPIE Advanced Lithography.

A lithography-friendly structured ASIC design approach

Mosong Cheng, Sunil P. Khatri, Rajesh Garg, 2008, GLSVLSI '08.

Survey of chemically amplified resist models and simulator algorithms

Lei Yuan, Mosong Cheng, Ebo H. Croffie, 2001, SPIE Advanced Lithography.

Efficient simulation of postexposure bake processes in STORM

Mosong Cheng, Ebo H. Croffie, Andrew R. Neureuther, 1999, Advanced Lithography.

Optical coupling of lens, liquid and resist in immersion lithography: rigorous model and assessment

Mosong Cheng, Hidetami Yaegashi, Benjamin C. P. Ho, 2004, SPIE Advanced Lithography.

Modeling chemically amplified resists for 193-nm lithography

Mosong Cheng, Andrew R. Neureuther, Omkaram Nalamasu, 2000, Advanced Lithography.

OPC rectification of random space patterns in 193-nm lithography

Andrew R. Neureuther, Mosong Cheng, Keeho Kim, 2002, SPIE Advanced Lithography.

Fast imaging algorithm for simulating pattern transfer in deep-UV resist and extracting postexposure bake parameters

Andrew R. Neureuther, Mosong Cheng, Ebo H. Croffie, 2000, Advanced Lithography.

Simulation of sub-90-nm node complementary phase-shift processes with ArF lithography

Mosong Cheng, Kathleen Nafus, Benjamin C. P. Ho, 2003, SPIE Advanced Lithography.

Impact of mask topography and resist effects on optical proximity correction in advanced alternating phase-shift process

Mosong Cheng, Benjamin C. P. Ho, Doug E. Guenther, 2003, SPIE Advanced Lithography.

Line-edge roughness (LER) optimization on 300-mm DUV alternating phase shift (altPSM) processes

Mosong Cheng, Kathleen Nafus, Bob Brown, 2003, SPIE Advanced Lithography.

Physics behind the new technique sensing of phage-triggered ion cascades (SEPTIC) for the prompt identification of bacteria (Invited Paper)

Mosong Cheng, L. B. Kish, Sungkyu Seo, 2005, SPIE International Symposium on Fluctuations and Noise.

Nano device for monitoring electrical fluctuations on bacterial scale (Invited Paper)

Mosong Cheng, Laszlo B. Kish, Maria Dobozi-King, 2005, SPIE International Symposium on Fluctuations and Noise.

ArF imaging modeling by using resist simulation and pattern matching

Mosong Cheng, Andrew R. Neureuther, A. Neureuther, 2001, SPIE Advanced Lithography.

Moving boundary transport model for acid diffusion in chemically amplified resists

Mosong Cheng, Ebo H. Croffie, Andrew R. Neureuther, 1999 .

Modeling anomalous depth dependent dissolution effects in chemically amplified resists

Mosong Cheng, Ebo H. Croffie, Andrew R. Neureuther, 2000 .

Optical focusing of plasmonic Fresnel zone plate-based metallic structure covered with a dielectric layer

Mosong Cheng, Hyungduk Ko, Hyungduk Ko, 2008 .

Subwavelength proximity nanolithography using a plasmonic lens

Mosong Cheng, Sungkyu Seo, S. Seo, 2007 .

Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imaging

Mosong Cheng, Ebo H. Croffie, Andrew R. Neureuther, 2000 .

Patterning a nanowell sensor biochip for specific and rapid detection of bacteria

Mosong Cheng, Laszlo B. Kish, Maria Dobozi-King, 2008 .

Overview of the STORM program application to 193nm singe layer resists

Mosong Cheng, Ebo H. Croffie, Andrew R. Neureuther, 2000 .