Thomas V. Pistor

发表

LAVA web-based remote simulation: enhancements for education and technology innovation

Sang Il Lee, Ka Chun Ng, Takashi Orimoto, 2001, SPIE Advanced Lithography.

Calculating aerial images from EUV masks

Thomas V. Pistor, Andrew R. Neureuther, 1999, Advanced Lithography.

Simulation of image quality issues at low k1 for 100-nm lithography

Konstantinos Adam, Thomas V. Pistor, Garth Robins, 2001, Photomask Japan.

Modeling of light intensification by conical pits within multilayer high reflector coatings

Michael D. Feit, Thomas V. Pistor, Christopher J. Stolz, 2009, Laser Damage.

Investigating deprotection-induced shrinkage and retro-grade sidewalls in NTD resists

Yan Wang, Thomas V. Pistor, Sohan Singh Mehta, 2015, Advanced Lithography.

Effects of shifter edge topography on through focus performance

Konstantinos Adam, Thomas V. Pistor, Andrew R. Neureuther, 2001, SPIE Photomask Technology.

Atomic force metrology and 3D modeling of microtrenching in etched photomask features

Thomas V. Pistor, Edward K. Miller, Bradley Todd, 2001, SPIE Advanced Lithography.

Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

Thomas V. Pistor, Patrick P. Naulleau, Andrew R. Neureuther, 2017, Advanced Lithography.

Rigorous electromagnetic simulation of stepper alignment

Thomas V. Pistor, Robert John Socha, 2002, SPIE Advanced Lithography.

Modeling oblique incidence effects in photomasks

Thomas V. Pistor, Andrew R. Neureuther, Robert John Socha, 2000, Advanced Lithography.

Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach

Kenneth A. Goldberg, Iacopo Mochi, Thomas V. Pistor, 2015, Advanced Lithography.

Accuracy issues in the finite difference time domain simulation of photomask scattering

Thomas V. Pistor, 2001, SPIE Advanced Lithography.

Simulating photomask edge roughness and corner rounding

Konstantinos Adam, Thomas V. Pistor, Robert John Socha, 1997, Advanced Lithography.

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Kenneth A. Goldberg, Iacopo Mochi, Thomas V. Pistor, 2015 .

Rigorous electromagnetic simulation applied to alignment systems

Yunfei Deng, Thomas V. Pistor, Andrew R. Neureuther, 2001, SPIE Advanced Lithography.

Models for characterizing the printability of buried EUV defects

Yunfei Deng, Thomas V. Pistor, Andrew R. Neureuther, 2001, SPIE Advanced Lithography.

Electromagnetic Simulation and Modeling With Applications In Lithography

Thomas V. Pistor, T. Pistor, 2001 .

Rigorous 3D simulation of phase defects in alternating phase-shifting masks

Thomas V. Pistor, 2002, SPIE Photomask Technology.

Simulation of reflective notching with TEMPEST

Thomas V. Pistor, Andrew R. Neureuther, 1997, Advanced Lithography.

Atomic force metrology and 3D modeling of microtrenching in etched photomask features

Thomas V. Pistor, Kirk Miller, Bradley Todd, 2001, Photomask Japan.

Impact of substrate surface scratches on the laser damage resistance of multilayer coatings

Michael D. Feit, Thomas V. Pistor, Christopher J. Stolz, 2010, Laser Damage.

Photoresist shrinkage effects at EUV

Thomas V. Pistor, Patrick P. Naulleau, Thomas I. Wallow, 2011, Advanced Lithography.

Bias optimization through simulation for contact array pattern

Thomas V. Pistor, Ksenia Berger, 2003, SPIE Photomask Technology.

Rigorous simulation of mask corner effects in extreme ultraviolet lithography

Konstantinos Adam, Thomas V. Pistor, Andrew R. Neureuther, 1998 .

Analysis of sub-wavelength sized OPC features

Konstantinos Adam, Thomas V. Pistor, Robert John Socha, 1998 .

Light Intensification Modeling of Coating Inclusions Irradiated at 351 and 1053 nm

Thomas V. Pistor, Christopher J. Stolz, Scott Hafeman, 2007 .

Light intensification by nodular defects in multilayer coatings

Thomas V. Pistor, Christopher J. Stolz, Francois Y. Genin, 2004 .