Mike V. Williamson

LAVA web-based remote simulation: enhancements for education and technology innovation

Sang Il Lee, Ka Chun Ng, Takashi Orimoto, 2001, SPIE Advanced Lithography.

Effects of image contrast and resist types upon line edge roughness (LER)

Xiaofan Meng, Mike V. Williamson, Andrew R. Neureuther, 2002, SPIE Advanced Lithography.

Effect of background exposure dose upon line-edge roughness (LER)

Mike V. Williamson, Andrew R. Neureuther, 2004, SPIE Advanced Lithography.

Lithographic performance of advanced thin resists

Mike V. Williamson, Andrew R. Neureuther, 2000, Advanced Lithography.

Enhanced quantitative analysis of resist image contrast upon line- edge roughness (LER)

Mike V. Williamson, Andrew R. Neureuther, 2003, SPIE Advanced Lithography.

Utilizing maximum likelihood deblurring algorithm to recover high frequency components of scanning electron microscopy images

Mike V. Williamson, Andrew R. Neureuther, 2004 .

Lithographic performance of thin dendritic polymer resists

Mike V. Williamson, Andrew R. Neureuther, 2000 .