C. E. Murabito

CD reference features with sub-five nanometer uncertainty

M. W. Cresswell, R. A. Allen, A. Hunt, 2005, SPIE Advanced Lithography.

Test structures for referencing electrical linewidth measurements to silicon lattice parameters using HRTEM

L. W. Linholm, C. E. Murabito, W. Guthrie, 2002, Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002..

RM 8111: Development of a Prototype Linewidth Standard

Richard A. Allen, Ronald G. Dixson, Michael W. Cresswell, 2006, Journal of research of the National Institute of Standards and Technology.

Process optimization for lattice-selective wet etching of crystalline silicon structures

Ndubuisi G. Orji, Richard A. Allen, Ronald G. Dixson, 2016 .