J. V. Martinez de Pinillos

CD reference features with sub-five nanometer uncertainty

M. W. Cresswell, R. A. Allen, A. Hunt, 2005, SPIE Advanced Lithography.

RM 8111: Development of a Prototype Linewidth Standard

Richard A. Allen, Ronald G. Dixson, Michael W. Cresswell, 2006, Journal of research of the National Institute of Standards and Technology.