C. G. Willson

发表

Advances in resist technology and processing III : 10-11 March 1986, Santa Clara, California

C. G. Willson, 1986 .

Statistical Process Control Lab

C. G. Willson, Jenna Hartmann, 2007 .

[acs symposium series] materials for microlithography volume 266 (radiation-sensitive polymers) || synthesis, characterization and lithographic evaluation of chlorinated polymethylstyrene

C. G. Willson, L. F. Thompson, J. M. J. FrÃ©chet, 1985 .

Improved simulation of photoresists using new development models

Clifford L. Henderson, Ralph R. Dammel, C. G. Willson, 1998, Advanced Lithography.

Direct imprinting of dielectric materials for dual damascene processing

David Wang, Michael D. Stewart, C. G. Willson, 2005, SPIE Advanced Lithography.

SELF-DEVELOPING RESISTS FOR DIRECT-VIEWING ALIGNMENT.

Burn Jeng Lin, C. G. Willson, V. W. Chao, 1984 .

Introduction to microlithography : theory, materials, and processing

C. G. Willson, L. F. Thompson, M. J. Bowden, 1983 .

Fundamental study of optical threshold layer approach towards double exposure lithography

Paul Zimmerman, C. G. Willson, Saul Lee, 2009, Advanced Lithography.

Shock compression synthesis of hard materials

C. G. Willson, 1999 .

Use Of A Quartz Crystal Microbalance Rate Monitor To Examine Photoproduct Effects On Resist Dissolution

William D. Hinsberg, C. G. Willson, K. K. Kanazawa, 1985, Advanced Lithography.

Advances in resist technology : March 12-13, 1984, Santa Clara, California

C. G. Willson, 1984 .

Multi-level step and flash imprint lithography for direct patterning of dielectrics

Michael D. Stewart, C. G. Willson, Bin Li, 2006, SPIE Advanced Lithography.

Ultrafast High Resolution Contact Lithography Using Excimer Lasers

Burn Jeng Lin, C. G. Willson, K. Jain, 1982, Advanced Lithography.

A 2-Layer Resist System Derived From Trimethylsilylstyrene

C. G. Willson, S. A. MacDonald, R. D. Allen, 1986, Advanced Lithography.

Materials for microlithography : radiation-sensitive polymers

Jean M. J. Fréchet, C. G. Willson, C. Willson, 1985 .

Photogeneration of Amines from α-Keto Carbamates: Design and Preparation of Photoactive Compounds.

Jean M. J. Fréchet, James F. Cameron, C. G. Willson, 1997 .

Ultrafast high-resolution contact lithography with excimer lasers

Burn Jeng Lin, C. G. Willson, C. Willson, 1982 .

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

David B. Graves, Robert L. Bruce, C. G. Willson, 2010 .

Introduction to microlithography

C. G. Willson, M. J. Bowden, C. Willson, 1994 .