Jeroen Van de Kerkhove

Calibration of physical resist models: methods, usability, and predictive power

Thomas Mülders, Thomas Schmöller, Ulrich Klostermann, 2009 .

High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography

Hiroyuki Shindo, Ir Kusnadi, John L. Sturtevant, 2011 .

Alignment and averaging of scanning electron microscope image contours for optical proximity correction modeling purposes

Peter De Bisschop, Jeroen Van de Kerkhove, 2010 .