Brent E. Boerger

Advances in CPL, collimated plasma source and full field exposure for sub-100-nm lithography

I. C. Edmond Turcu, Scott McLeod, Brent E. Boerger, 2003, SPIE Advanced Lithography.

High-power laser-produced plasma source for nanolithography

Harry Rieger, Brent E. Boerger, Celestino J. Gaeta, 2004, SPIE Optics + Photonics.

Fabrication of flexible ultracapacitor/galvanic cell hybrids using advanced nanoparticle coating technology

Brent E. Boerger, M. Peckerar, N. Goldsman, 2011 .