Mordechai Rothschild

发表

Marathon damage testing of pellicles for 193-nm lithography

Roderick R. Kunz, Vladimir Liberman, Andrew Grenville, 1997, Photomask Technology.

High fluence testing of optical materials for 193-nm lithography extensions applications

Vladimir Liberman, Paul Zimmerman, Mordechai Rothschild, 2010, Advanced Lithography.

157 nm: Deepest deep-ultraviolet yet

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 1999 .

Preliminary microfluidic simulations for immersion lithography

Roxann L. Engelstad, Greg F. Nellis, Alexander C. Wei, 2003, SPIE Advanced Lithography.

Scattering in liquid immersion lithography

Roderick R. Kunz, Theodore M. Bloomstein, Michael S. Yeung, 2004, SPIE Advanced Lithography.

Assessment of optical coatings for 193-nm lithography

Vladimir Liberman, Chris K. Van Peski, Mordechai Rothschild, 1998, Advanced Lithography.

Stripe-teeth metamaterial Al- and Nb-based rectennas (Presentation Recording)

Richard M. Osgood, Mordechai Rothschild, Stephen A. Giardini, 2015, SPIE NanoScience + Engineering.

Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild, Jan H. C. Sedlacek, 1992, Advanced Lithography.

Laser durability studies of high index immersion fluids: fluid degradation and optics contamination effects

Vladimir Liberman, Paul Zimmerman, Mordechai Rothschild, 2007, SPIE Advanced Lithography.

Behavior of candidate organic pellicle materials under 157-nm laser irradiation

Vladimir Liberman, Roger H. French, Mordechai Rothschild, 2002, SPIE Advanced Lithography.

Excimer-laser induced degradation in bulk-fused silica

Mordechai Rothschild, Jan H. C. Sedlacek, 1993, Laser Damage.

Performance of excimer lasers as light sources for 193-nm lithography

Roderick R. Kunz, Scott P. Doran, Mordechai Rothschild, 1997, Advanced Lithography.

193-nm lithography (Review Paper)

Roderick R. Kunz, Mordechai Rothschild, Jan H. C. Sedlacek, 1996, Photonics West.

Assessment of Nanotechnology for Chemical Biological Defense

Roderick R. Kunz, Mordechai Rothschild, Michael Switkes, 2009 .

Lithography at a wavelength of 193 nm

Roderick R. Kunz, Mordechai Rothschild, Susan C. Palmateer, 1997, IBM J. Res. Dev..

Interference lithography at 157 nm

Theodore M. Bloomstein, Mordechai Rothschild, Michael Switkes, 2000, Advanced Lithography.

Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations

Marylyn Hoy Bennett, Theodore M. Bloomstein, Andrew Grenville, 2004, SPIE Advanced Lithography.

Laser-induced metal deposition and laser cutting techniques for fixing IC design errors

D. C. Shaver, Scott P. Doran, Mordechai Rothschild, 1991, Other Conferences.

Determination of optical properties of thin films and surfaces in 157-nm lithography

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2000, Advanced Lithography.

Optimization of a 193-nm silylation process for sub-0.25-um lithography

Roderick R. Kunz, Mordechai Rothschild, S. C. Palmateer, 1995, Advanced Lithography.

Laser cleaning of optical elements in 157-nm lithography

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2000, Advanced Lithography.

Long-term 193-nm laser irradiation of thin-film-coated CaF2 in the presence of H2O

Vladimir Liberman, Andrew Grenville, Mordechai Rothschild, 2004, SPIE Advanced Lithography.

Attenuating phase-shifting mask at 157 nm

Vladimir Liberman, Steven J. Spector, Mordechai Rothschild, 2002, SPIE Advanced Lithography.

Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2002, SPIE Advanced Lithography.

A 157-nm immersion microstepper

Theodore M. Bloomstein, Mordechai Rothschild, Michael Switkes, 2004, SPIE Advanced Lithography.

Marathon testing of optical materials for 193-nm lithographic applications

Vladimir Liberman, Chris K. Van Peski, Mordechai Rothschild, 1999, Laser Damage.

Damage testing of pellicles for 193-nm lithography

Roderick R. Kunz, Vladimir Liberman, Chris K. Van Peski, 1998, Advanced Lithography.

Long-term testing of optical components for 157-nm lithography

Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, 2000, Advanced Lithography.

157-nm pellicles: polymer design for transparency and lifetime

Roderick R. Kunz, Vladimir Liberman, Roger H. French, 2002, SPIE Advanced Lithography.

Photo-induced changes in 157-nm optical coatings

Vladimir Liberman, Theodore M. Bloomstein, Andrew Grenville, 2004, SPIE Advanced Lithography.

ning of Planar Millimeter-Wave hotochernica tchin

Mordechai Rothschild, Jan H. C. Sedlacek, Dylan F. Williams, 1987 .

Development and evaluation of 193nm immersion generation-three fluid candidates

Vladimir Liberman, Neal Lafferty, Bruce W. Smith, 2008, SPIE Advanced Lithography.

Review of technology for 157-nm lithography

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 2001, IBM J. Res. Dev..

Resolution enhancement of 157-nm lithography by liquid immersion

Mordechai Rothschild, Michael Switkes, M. Rothschild, 2002, SPIE Advanced Lithography.

Testing of optical materials for 193-nm applications

Vladimir Liberman, Chris K. Van Peski, Mordechai Rothschild, 1998, Optics & Photonics.

Optical materials and coatings at 157 nm

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 1999, Advanced Lithography.

Accelerated damage to blank and antireflectance-coated CaF2 surfaces under 157-nm laser irradiation

Vladimir Liberman, Andrew Grenville, Mordechai Rothschild, 2003, SPIE Advanced Lithography.

Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride

Vladimir Liberman, Chris K. Van Peski, Mordechai Rothschild, 1999, Advanced Lithography.

Low SWaP chemical sensing via a fabric-based spectrometer

Richard M. Osgood, Mordechai Rothschild, Richard P. Kingsborough, 2019, Defense + Commercial Sensing.

Simulation study of process latitude for liquid immersion lithography

Eytan Barouch, So-Yeon Baek, Michael S. Yeung, 2003, SPIE Advanced Lithography.

Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2003, SPIE Advanced Lithography.

Long-term laser durability testing of optical coatings and thin films for 157-nm lithography

Vladimir Liberman, Andrew Grenville, Mordechai Rothschild, 2002, SPIE Advanced Lithography.

Ambient effects on the laser durability of 157-nm optical coatings

Vladimir Liberman, Andrew Grenville, Mordechai Rothschild, 2003, SPIE Advanced Lithography.

Controlled contamination studies in 193-nm immersion lithography

Vladimir Liberman, Andrew Grenville, Mordechai Rothschild, 2004, SPIE Advanced Lithography.

UV cleaning of contaminated 157-nm reticles

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2001, SPIE Advanced Lithography.

Fiber-based chemical sensing and sensing platforms with colorimetric dyes

Richard M. Osgood, Mordechai Rothschild, Jimmy Xu, 2018, Defense + Security.

Immersion liquids for lithography in the deep ultraviolet

Roderick R. Kunz, Roger F. Sinta, Mordechai Rothschild, 2003, SPIE Advanced Lithography.

Seismic barrier protection of critical infrastructure

Vladimir Liberman, Mordechai Rothschild, Robert Haupt, 2017, 2017 IEEE International Symposium on Technologies for Homeland Security (HST).

Controlled contamination of optics under 157-nm laser irradiation

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 2001, SPIE Advanced Lithography.

Fast, electrically tunable filters for hyperspectral imaging

Vladimir Liberman, Mordechai Rothschild, C. Gear, 2014, Defense + Security Symposium.

Hybrid optical maskless lithography: Scaling beyond the 45nm node

Theodore H. Fedynyshyn, Theodore M. Bloomstein, Steven J. Spector, 2005 .

Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman, Chris K. Van Peski, Kevin J. Orvek, 2001, SPIE Advanced Lithography.

High-resolution, high-throughput, CMOS-compatible electron-beam patterning

Theodore H. Fedynyshyn, Mordechai Rothschild, Steven A. Vitale, 2017, Advanced Lithography.

High-throughput hybrid optical maskless lithography: all-optical 32-nm node imaging

P. Brooker, Mordechai Rothschild, M. Fritze, 2005, SPIE Advanced Lithography.

Optical materials for use with excimer lasers

Mordechai Rothschild, Jan H. C. Sedlacek, 1993, Other Conferences.

Valleytronics: Valleytronics: Opportunities, Challenges, and Paths Forward (Small 38/2018)

Di Xiao, Mordechai Rothschild, Pablo Jarillo-Herrero, 2018, Small.

Fluidic microoptics with adjustable focusing and beam steering for single cell optogenetics.

Edward S Boyden, Mordechai Rothschild, Todd Thorsen, 2017, Optics express.

Large-Area Dense Plasmonic Nanoarrays for Surface Enhanced Raman Applications

Vladimir Liberman, Theodore M. Bloomstein, Ahmed Busnaina, 2010 .

Simulation study of process latitude for liquid immersion lithography

Eytan Barouch, So-Yeon Baek, Michael S. Yeung, 2004 .

Lithography with 157 nm lasers

Roderick R. Kunz, Theodore M. Bloomstein, Mordechai Rothschild, 1997 .

Recent Trends in Optical Lithography

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 2004 .

Patterning of sub-50 nm dense features with space-invariant 157 nm interference lithography

Theodore M. Bloomstein, Mordechai Rothschild, Michael Switkes, 2000 .

Excimer-laser-induced densification of fused silica:laser-fluence and material-grade effects on the scaling law

Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, 1999 .

Bubbles in immersion lithography

Michael S. Yeung, Mordechai Rothschild, Michael Switkes, 2005 .

Three-dimensional metallodielectric photonic crystals exhibiting resonant infrared stop bands

Simon Verghese, Mordechai Rothschild, Elliott R. Brown, 1997 .

A Roadmap for Optical Lithography

Mordechai Rothschild, M. Rothschild, 2010 .

Deep-UV microsphere-assisted ultramicroscopy

Vladimir Liberman, Mordechai Rothschild, Kenneth W. Allen, 2015, 2015 17th International Conference on Transparent Optical Networks (ICTON).

Extending optics to 50 nm and beyond with immersion lithography

Roderick R. Kunz, Roger F. Sinta, So-Yeon Baek, 2003 .

Excimer‐laser etching of diamond and hard carbon films by direct writing and optical projection

Mordechai Rothschild, Daniel J. Ehrlich, C. Arnone, 1986 .

A Novel Method for Remotely Detecting Trace Explosives

Roderick R. Kunz, Mordechai Rothschild, Stephen T. Palmacci, 2008 .

22-nm immersion interference lithography.

Mordechai Rothschild, T M Bloomstein, S. Deneault, 2006, Optics express.

Photolithography at wavelengths below 200 nm

Mordechai Rothschild, 1998, Technical Digest. Summaries of Papers Presented at the Conference on Lasers and Electro-Optics. Conference Edition. 1998 Technical Digest Series, Vol.6 (IEEE Cat. No.98CH36178).

Studies of consequences of photo-acid generator leaching in 193nm immersion lithography

Vladimir Liberman, Mordechai Rothschild, Andrew Grenville, 2006, SPIE Advanced Lithography.

Aluminum plasmonics: optimization of plasmonic properties using liquid-prism-coupled ellipsometry.

Vladimir Liberman, Mordechai Rothschild, D. M. Lennon, 2013, Optics express.

Resists and Other Critical Issues in 157-nm Lithography

Roderick R. Kunz, Theodore H. Fedynyshyn, Vladimir Liberman, 2000 .

Photolithography at 193 nm

D. C. Shaver, Mark A. Hartney, Roderick R. Kunz, 1992 .

Marathon evaluation of optical materials for 157-nm lithography

Vladimir Liberman, Kevin J. Orvek, Mordechai Rothschild, 2001 .

Excimer laser induced damage in fused silica

D. C. Shaver, Mordechai Rothschild, Daniel J. Ehrlich, 1990 .

Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild, Jan H. C. Sedlacek, 1993 .

Nonlinear bleaching, absorption, and scattering of 532-nm-irradiated plasmonic nanoparticles

Michael Sworin, Vladimir Liberman, Mordechai Rothschild, 2013 .

Resolution enhancement of 157 nm lithography by liquid immersion

Mordechai Rothschild, Michael Switkes, 2002 .

Plasma‐deposited organosilicon thin films as dry resists for deep ultraviolet lithography

Stella W. Pang, Mordechai Rothschild, Mark W. Horn, 1990 .

Effects of excimer laser irradiation on the transmission, index of refraction, and density of ultraviolet grade fused silica

D. C. Shaver, Mordechai Rothschild, Daniel J. Ehrlich, 1989 .

Materials issues for optical components and photomasks in 157 nm lithography

Vladimir Liberman, Theodore M. Bloomstein, Mordechai Rothschild, 1999 .

High resolution studies of crystalline damage induced by lapping and single-point diamond machining of Si(100)

Roderick R. Kunz, Mordechai Rothschild, H. Clark, 1996 .

Evaluation of depth‐of‐focus in photolithography at 193 and 248 nm for feature sizes of 0.25 μm and below

Steven A. Orszag, Eytan Barouch, Uwe Hollerbach, 1993 .

Aluminum oxides as imaging materials for 193‐nm excimer laser lithography

Roderick R. Kunz, Stella W. Pang, Mordechai Rothschild, 1989 .

Impact of photoacid generator leaching on optics photocontamination in 193-nm immersion lithography

Vladimir Liberman, Mordechai Rothschild, Andrew Grenville, 2007 .

Critical issues in 157 nm lithography

Roderick R. Kunz, Theodore M. Bloomstein, Mordechai Rothschild, 1998 .

Wafer-Scale Aluminum Nanoplasmonic Resonators with Optimized Metal Deposition

Vladimir Liberman, Mordechai Rothschild, D. M. Lennon, 2016 .

Liquid immersion lithography: Why, how, and when?

Roderick R. Kunz, Vladimir Liberman, Theodore M. Bloomstein, 2004 .

Prospects for photolithography at 121 nm

Vladimir Liberman, Mordechai Rothschild, Stephen T. Palmacci, 2002 .