Carl E. Larson

Characterization and acid diffusion measurements of new strong acid photoacid generators

Gregory M. Wallraff, Carl E. Larson, Nicolette Fender, 2002, SPIE Advanced Lithography.

Aliphatic platforms for the design of 157-nm chemically amplified resists

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 2002, SPIE Advanced Lithography.

Combinitorial resist processing studies

Gregory M. Wallraff, Carl E. Larson, 2004, SPIE Advanced Lithography.

Amine control for DUV lithography: identifying hidden sources

Carl E. Larson, Oleg P. Kishkovich, 2000, Advanced Lithography.

Studies of acid diffusion in low Ea chemically amplified photoresists

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2005, SPIE Advanced Lithography.