David S. Perloff

Gauging the future: The long term business outlook for metrology and wafer inspection equipment

David S. Perloff, 1998 .

A van der Pauw resistor structure for determining mask superposition errors on semiconductor slices

David S. Perloff, 1978 .

Four‐Point Probe Correction Factors for Use in Measuring Large Diameter Doped Semiconductor Wafers

David S. Perloff, D. Perloff, 1976 .

Four‐Point Sheet Resistance Measurements of Semiconductor Doping Uniformity

David S. Perloff, D. Perloff, Frederick E. Wahl, 1977 .

Four-point sheet resistance correction factors for thin rectangular samples

David S. Perloff, 1977 .