J Gobrecht

Proceedings of 28th International conference on Micro- and Nanoengineering (MNE"02, Sept. 16-19, 2003, Lugano, Switzerland)

Peter Vettiger, Jürgen Brugger, U. Staufer, 2003 .

Top-down fabricated silicon nanowires under tensile elastic strain up to 4.5%

J Gobrecht, J. Faist, K. Bourdelle, 2012, Nature Communications.

Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.

L Wang, J Gobrecht, Y. Ekinci, 2015, Nanoscale.

Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography

J Gobrecht, Y. Ekinci, E. Kirk, 2014, Nanotechnology.