Andrey E. Yakshin

Prevention of MoSi multilayer reflection loss in EUVL tools

Hans Meiling, Eric Louis, Marco Wedowski, 2001, SPIE Optics + Photonics.

New PTB beamlines for high-accuracy EUV reflectometry at BESSY II

Frank Scholze, Fred Bijkerk, Eric Louis, 2000, SPIE Optics + Photonics.

Temperature-dependent nanocrystal formation in Mo/Si multilayers

Frederik Bijkerk, Andrey E. Yakshin, I. Nedelcu, 2007 .

Molecular contamination mitigation in EUVL by environmental control

Hans Meiling, Frank Scholze, Eric Louis, 2002 .

Determination of the layered structure in Mo/Si multilayers by grazing incidence X-ray reflectometry

Frederik Bijkerk, Edward L. G. Maas, Andrey E. Yakshin, 2000 .