E.J. Nowak

Turning silicon on its edge [double gate CMOS/FinFET technology]

E.J. Nowak, I. Aller, T. Ludwig, 2004, IEEE Circuits and Devices Magazine.

RTA-Driven Intra-Die Variations in Stage Delay, and Parametric Sensitivities for 65nm Technology

H. Kimura, E.J. Nowak, M. Gribelyuk, 2006, 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

Improved effective switching current (IEFF+) and capacitance methodology for CMOS circuit performance prediction and model-to-hardware correlation

E.J. Nowak, Jie Deng, N. Zamdmer, 2008, 2008 IEEE International Electron Devices Meeting.

45 nm SOI and Beyond - Getting to a General Purpose Technology

E.J. Nowak, S.S. Iyer, 2007, 2007 IEEE International SOI Conference.

Modeling of Variation in Submicrometer CMOS ULSI Technologies

E.J. Nowak, Ning Lu, Sungjae Lee, 2006, IEEE Transactions on Electron Devices.

The effective drive current in CMOS inverters

E.J. Nowak, W. Haensch, M.H. Na, 2002, Digest. International Electron Devices Meeting,.