Z.P. Sobczak

Composite TiSi2/n + poly-Si low-resistivity gate electrode and interconnect for VLSI device technology

K.L. Wang, A.F. Tasch, T.C. Holloway, 1982, IEEE Transactions on Electron Devices.

Device fabrication in {100} silicon-on-oxide produced by a scanning CW-laser-induced lateral seeding technique

Z.P. Sobczak, A.F. Tasch, R.F. Pinizzotto, 1982, IEEE Transactions on Electron Devices.