Daisuke Hibino

发表

The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-contours from wafer and mask

Hiroyuki Shindo, Thuy Do, Ir Kusnadi, 2011, Photomask Technology.

Weighting evaluation for improving OPC model quality by using advanced SEM-contours from wafer and mask

Hiroyuki Shindo, John L. Sturtevant, Daisuke Hibino, 2012, Advanced Lithography.

Contour-based self-aligning calibration of OPC models

Thuy Do, Ir Kusnadi, John L. Sturtevant, 2010, Advanced Lithography.

CD-SEM tool stability and tool-to-tool matching management using image sharpness monitor

Hideaki Abe, Tatsuya Maeda, Daisuke Hibino, 2009, Advanced Lithography.

High-accuracy OPC-modeling by using advanced CD-SEM based contours in the next-generation lithography

Hiroyuki Shindo, Thuy Do, Ir Kusnadi, 2010, Advanced Lithography.

Defect window analysis by using SEM-contour based shape quantifying method for sub-20nm node production

Hiroyuki Shindo, Daisuke Hibino, Yuji Enomoto, 2013, Advanced Lithography.

SEM-contour shape analysis method for advanced semiconductor devices

Hiroyuki Shindo, Daisuke Hibino, Hideo Sakai, 2013, Advanced Lithography.

High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography

Hiroyuki Shindo, Ir Kusnadi, John L. Sturtevant, 2011 .

The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and mask

Hiroyuki Shindo, Ir Kusnadi, John L. Sturtevant, 2011, Advanced Lithography.