Y. I. Nissim

Light Assisted CVD For Thin Dielectric Film Deposition

D. Bensahel, C. Licoppe, Y. I. Nissim, 1989, Other Conferences.

Differences in the SiO2/InP interfaces obtained by thermal and UV-induced chemical vapour deposition

J. Flicstein, Y. I. Nissim, J. M. Moison, 1992 .

Temperature distributions produced in semiconductors by a scanning elliptical or circular cw laser beam

James F. Gibbons, R. B. Gold, Y. I. Nissim, 1980 .

Microprobe Raman analysis of picosecond laser annealed implanted silicon

J. Sapriel, Y. I. Nissim, J. Oudar, 1983 .

A triple channel HEMT on InP (Camel HEMT) for large-signal high-speed applications

Jean Decobert, A. Scavennec, H. Maher, 1999 .

A combination of rapid thermal processing and photochemical deposition for the growth of SiO2 suitable for InP device applications

J. Flicstein, Y. I. Nissim, C. Licoppe, 1990 .