J. L. Regolini

Light Assisted CVD For Thin Dielectric Film Deposition

D. Bensahel, C. Licoppe, Y. I. Nissim, 1989, Other Conferences.

Selective layers of TiSi2 deposited without substrate consumption in a cold wall LPCVD reactor

D. Bensahel, J. L. Regolini, G. Bomchil, 1989 .