Anda E. Grigorescu

Sub-10-nm structures written in ultra-thin HSQ resist layers using electron-beam lithography

Anda E. Grigorescu, Marco C. van der Krogt, Cees W. Hagen, 2007, SPIE Advanced Lithography.

10nm lines and spaces written in HSQ, using electron beam lithography

C. W. Hagen, Pieter Kruit, Anda E. Grigorescu, 2007 .

Limiting factors for electron beam lithography when using ultra-thin hydrogen silsesquioxane layers

Cornelis W. Hagen, Anda E. Grigorescu, Marco C. van der Krogt, 2007 .

Resist thickness effects on ultra thin HSQ patterning capabilities

Anda E. Grigorescu, V. Sidorkin, E. V. D. Drift, 2009 .