Ratnam Sooriyakumaran

Acid-catalyzed pinacol rearrangement: chemically amplified reverse polarity change

Hiroshi Ito, Ratnam Sooriyakumaran, Eugene A. Mash, 1991, Other Conferences.

Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers

Ratnam Sooriyakumaran, Wu-Song Huang, Ranee W. Kwong, 1998, Advanced Lithography.

Molecular resists based on polyhedral oligomeric silsesquioxanes (POSS)

Hiroshi Ito, Dario L. Goldfarb, Sean D. Burns, 2005, SPIE Advanced Lithography.

Negative DUV photoresist for 16Mb-DRAM production and future generations

Will Conley, William R. Brunsvold, John L. Sturtevant, 1993, Advanced Lithography.

Direct determination of photoresist composition changes during UV exposure

Frances A. Houle, Ratnam Sooriyakumaran, Vaughn R. Deline, 2006, SPIE Advanced Lithography.