Tsuneo Terasawa

发表

0.3-micron Optical Lithography Using A Phase-Shifting Mask

Tsuneo Terasawa, Norio Hasegawa, Toshiei Kurosaki, 1989, Advanced Lithography.

Development of extreme ultraviolet mask pattern inspection technology using projection electron beam optics

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013 .

Adaptive Optical Proximity Correction Using an Optimization Method

Osamu Suga, Tsuneo Terasawa, Tetsuaki Matsunawa, 2007, 7th IEEE International Conference on Computer and Information Technology (CIT 2007).

Recent results from EUVL patterned mask inspection using projection electron microscope system

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014, Photomask Technology.

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuneo Terasawa, Hidehiro Watanabe, Tsuyoshi Amano, 2014 .

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuneo Terasawa, Hidehiro Watanabe, Tsuyoshi Amano, 2014, Advanced Lithography.

Actinic detection and screening of multilayer defects on EUV mask blanks using dark-field imaging

Tsuneo Terasawa, Masaaki Ito, Y. Tezuka, 2004, Photomask Japan.

Development of new inspection system with novel PEM for EUV pattern masks and its performance evaluation

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2014, Photomask and Next Generation Lithography Mask Technology.

Mask Inspection Technology for 65nm (hp) Technology Node and Beyond

Nobuyuki Yoshioka, Tsuneo Terasawa, Dong-Hoon Chung, 2005 .

Extreme ultraviolet mask defect observation using an extreme ultraviolet microscope

Tsuneo Terasawa, Hidehiro Watanabe, Tsuyoshi Amano, 2013, Photomask Technology.

EUV patterned mask inspection with an advanced projection electron microscope (PEM) system

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014, Advanced Lithography.

Suppression of resist pattern deformation on SiON bottom antireflective layer in deep-UV lithography

Takashi Hattori, Tsuneo Terasawa, Toshiyuki Mine, 1999, Advanced Lithography.

High-speed actinic EUV mask blank inspection with dark-field imaging

Tsuneo Terasawa, Masaaki Ito, Y. Tezuka, 2004, Photomask Japan.

Extreme ultraviolet mask defect inspection with a half pitch 16-nm node using simulated projection electron microscope images

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013 .

Characterization of CCD sensor for actinic mask blank inspection

Tsuneo Terasawa, Toshihiko Tanaka, Y. Tezuka, 2006, SPIE Advanced Lithography.

Variable phase-shift mask for deep-submicron optical lithography

Tsuneo Terasawa, Norio Hasegawa, Akira Imai, 1991, Other Conferences.

Evaluation of novel projection electron microscopy (PEM) optics for EUV mask inspection

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Advanced Lithography.

Improved signal to noise ratio in actinic EUVL mask blank inspection

Tsuneo Terasawa, Takeshi Yamane, 2012, Other Conferences.

Actinic EUVL mask blank inspection capability with time delay integration mode

Osamu Suga, Tsuneo Terasawa, Toshihiko Tanaka, 2009, Photomask Technology.

AFM measurement of linewidth with sub-nanometer scale precision

Tsuneo Terasawa, Satoshi Gonda, Tomizo Kurosawa, 2005, SPIE Advanced Lithography.

Analysis of phase defect effect on contact hole pattern using a programmed phase defect in EUVL mask

Tsuneo Terasawa, Hidehiro Watanabe, Tsuyoshi Amano, 2014, Advanced Lithography.

Effect of phase defect shape on ABI signal intensity and defect image intensity on wafer with simulation

Noriaki Takagi, Tsuneo Terasawa, Yukiyasu Arisawa, 2013, Advanced Lithography.

Verification of the system of defect inspection on patterned wafers using sub-200nm wavelength light

Tsuneo Terasawa, Toshihiko Tanaka, Tetsuo Takahashi, 2006, SPIE Advanced Lithography.

The capability of high magnification review function for EUV actinic blank inspection tool

Tsuneo Terasawa, Hidehiro Watanabe, Ichiro Mori, 2013, Photomask and Next Generation Lithography Mask Technology.

Signal analysis for the actinic full-field EUVL mask blank inspection system

Osamu Suga, Tsuneo Terasawa, Toshihiko Tanaka, 2008, Photomask Technology.

Patterned mask inspection technology with projection electron microscope technique on extreme ultraviolet masks

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2014 .

Design and development of a novel actinic inspection tool for EUV multilayer-coated mask blanks

Tsuneo Terasawa, Masaaki Ito, Toshihisa Tomie, 2003, SPIE Advanced Lithography.

Nanometer-level metrology with a low-voltage CD SEM

Tsuneo Terasawa, Jiro Yamamoto, Hideo Todokoro, 1998, Advanced Lithography.

Thermal analysis of EUV mask under inspection laser beam irradiation

Yasushi Nishiyama, Osamu Suga, Tsuneo Terasawa, 2007, Photomask Japan.

Evaluation of defect inspection sensitivity using 199-nm inspection optics

Yasushi Nishiyama, Osamu Suga, Shingo Murakami, 2007, Photomask Japan.

Algorithm for Phase-Shift Mask Design with Priority on Shifter Placement

Tsuneo Terasawa, Norio Hasegawa, Shinji Okazaki, 1993 .

EUV actinic blank inspection tool with a high magnification review mode

Soichi Inoue, Tsuneo Terasawa, Hidehiro Watanabe, 2012, Other Conferences.

The novel approach for optical proximity correction using genetic algorithms

Osamu Suga, Nobuyuki Yoshioka, Tsuneo Terasawa, 2005, SPIE Photomask Technology.

Propagation of surface topography of EUV blank substrate through multilayer and impact of phase defect structure on wafer image

Tsuneo Terasawa, Tsuyoshi Amano, 2013, Advanced Lithography.

Effect of condenser tilt on projection images produced by a phase-shifting mask

Tsuneo Terasawa, Norio Hasegawa, Souichi Katagiri, 1992, Advanced Lithography.

Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks

Eiji Tsujimoto, Tsuneo Terasawa, Junya Sakemi, 1997, Photomask and Next Generation Lithography Mask Technology.

Selete's EUV program: progress and challenges

Takao Taguchi, Osamu Suga, Tsuneo Terasawa, 2008, SPIE Advanced Lithography.

Optical system for high-throughput EUV lithography

Tsuneo Terasawa, Masaaki Ito, Hiromasa Yamanashi, 1996, Advanced Lithography.

Development of inspection system for EUV mask with novel projection electron microscopy (PEM)

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013, Photomask Technology.

Effects of radially nonsymmetric pupil filters and multiple-pupil exposure

Hiroshi Fukuda, Tsuneo Terasawa, Rudolf M. von Buenau, 1996, Advanced Lithography.

Multilayer bottom topography effect on actinic mask-blank inspection signal

Osamu Suga, Tsuneo Terasawa, Toshihiko Tanaka, 2007, Photomask Japan.

Alignment technique using wafer rear surface

Tsuneo Terasawa, Souichi Katagiri, Shigeo Moriyama, 1992, Advanced Lithography.

EUV patterned mask inspection system using a projection electron microscope technique

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Photomask Technology.

Sub-wavelength optical lithography

Tsuneo Terasawa, 2000 .

Study on EUV mask defect inspection with hp 16nm node using simulated projection electron microscope images

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Advanced Lithography.

FIB mask repair technology for EUV mask

Tsuneo Terasawa, Yasushi Nishiyama, Tsuyoshi Amano, 2009, Photomask Japan.

Compact high-resolution homodyne interferometer for nanometer-scale multidimensional AFM metrology

Tsuneo Terasawa, Satoshi Gonda, Hironori Noguchi, 2004, SPIE Optics + Photonics.

Embedded tutorial: subwavelength lithography

Tsuneo Terasawa, 2000, ASP-DAC '00.

Performance in practical use of actinic EUVL mask blank inspection

Noriaki Takagi, Tsuneo Terasawa, Yongdae Kim, 2014, Photomask and Next Generation Lithography Mask Technology.

Improvement of actinic blank inspection and phase defect analysis

Osamu Suga, Tsuneo Terasawa, Toshihiko Tanaka, 2010, Photomask Technology.

Detection signal analysis of actinic inspection of EUV mask blanks using dark-field imaging

Hajime Aoyama, Tsuneo Terasawa, Toshihiko Tanaka, 2007, SPIE Advanced Lithography.

Impact of the phase defect structure on an actinic dark-field blank inspection signal and wafer printability

Tsuneo Terasawa, Tsuyoshi Amano, Yukiyasu Arisawa, 2013 .

Phase-Shifting Technology for ULSI Patterning (Special Issue on Opto-Electronics and LSI)

Tsuneo Terasawa, Shinji Okazaki, 1993 .

Development of novel projection electron microscopy (PEM) system for EUV mask inspection

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2012, Other Conferences.

Concept of ultra-fast at-wavelength inspection of defects on a multilayer mask using a laser-produced plasma source

Tsuneo Terasawa, Masaaki Ito, Y. Tezuka, 2003, SPIE Advanced Lithography.

Actinic detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging

Tsuneo Terasawa, Masaaki Ito, Y. Tezuka, 2004, SPIE Advanced Lithography.

Actinic detection and signal characterization of multilayer defects on EUV mask blanks

Tsuneo Terasawa, Masaaki Ito, Y. Tezuka, 2004, SPIE Photomask Technology.

The study of EUVL mask defect inspection technology for 32-nm half-pitch node device and beyond

Osamu Suga, Nobutaka Kikuiri, Ryoichi Hirano, 2008, Photomask Technology.

Pattern inspection performance of novel Projection Electron Microscopy (PEM) on EUV masks

Tsuneo Terasawa, Takeshi Murakami, Ryoichi Hirano, 2013, Photomask and Next Generation Lithography Mask Technology.

Impact of EUV mask roughness on lithography performance

Tsuneo Terasawa, Hidehiro Watanabe, Yukiyasu Arisawa, 2013, Advanced Lithography.

Printing characteristics of proximity x-ray lithography and comparison with optical lithography for 100-nm node and below

Tsuneo Terasawa, Yoshinori Nakayama, Yasuji Matsui, 2000, Advanced Lithography.

Impact of mask blank and mirror surface roughness on actinic EUVL mask blank inspection signal

Osamu Suga, Tsuneo Terasawa, Toshihiko Tanaka, 2008, Photomask Japan.

Auxiliary pattern generation to cancel unexpected images at sidelobe overlap regions in attenuated phase-shift masks

Eiji Tsujimoto, Tsuneo Terasawa, Hiroshi Fukuda, 1999, Photomask and Next Generation Lithography Mask Technology.

Optical Proximity Correction using an Optimization Method after Layout Design

Osamu Suga, Tsuneo Terasawa, Tetsuaki Matsunawa, 2007 .

Mechanical property of organic resists for ArF lithography

Tsuneo Terasawa, Taku Morisawa, Toshihiko P. Tanaka, 2000, Advanced Lithography.

Heuristic Method for Phase-Conflict Minimization in Automatic Phase-Shift Mask Design

Tsuneo Terasawa, Junya Sakemi, Shinji Okazaki, 1995 .

Background level analysis on an actinic inspection image of EUVL mask blank

Tsuneo Terasawa, Takeshi Yamane, Myoungsoo Lee, 2013, Photomask and Next Generation Lithography Mask Technology.

Study of EUV mask inspection using projection EB optics with programmed pattern defect

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2012, Other Conferences.

Experimental verification of the effect of phase defect shape on ABI signal intensity

Noriaki Takagi, Tsuneo Terasawa, Yukiyasu Arisawa, 2014, Advanced Lithography.

Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation

Tsuneo Terasawa, Ryoichi Hirano, Hidehiro Watanabe, 2013, Photomask and Next Generation Lithography Mask Technology.

Propagation of surface topography of extreme ultraviolet blank substrate through multilayer and impact of phase defect structure on wafer image

Tsuneo Terasawa, Tsuyoshi Amano, 2013 .

Detection signal analysis of actinic inspection of EUV mask blanks using dark-field imaging

Tsuneo Terasawa, Toshihisa Tomie, Yoshihiro Tezuka, 2006, SPIE Advanced Lithography.

Three-dimensional metrology with side-wall measurement using tilt-scanning operation in digital probing AFM

Tsuneo Terasawa, Satoshi Gonda, Ken Murayama, 2006, SPIE Advanced Lithography.

Impact of electron scattering in extreme ultraviolet reflective multilayer on electron image

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2013 .

Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements

Kenneth A. Goldberg, Tsuneo Terasawa, Patrick A. Kearney, 2006 .

0.13 µm Pattern Delineation Using KrF Excimer Laser Light

Tsuneo Terasawa, Norio Hasegawa, Shinji Okazaki, 1994 .

Simulation of Multilayer Defects in Extreme Ultraviolet Masks

Tsuneo Terasawa, Iwao Nishiyama, Masaaki Ito, 2001 .

The Effect of Condenser Tilt on Optical Projection Lithography

Tsuneo Terasawa, Souichi Katagiri, Katsunobu Hama, 1991 .

Analysis of image distortion on projection electron microscope image

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2014 .

Critical-dimension measurement using multi-angle-scanning method in atomic force microscope

Tsuneo Terasawa, Satoshi Gonda, Sumio Hosaka, 2006 .

Evaluation of extreme ultraviolet mask defect using blank inspection, patterned mask inspection, and wafer inspection

Osamu Suga, Kazuo Tawarayama, Tsuneo Terasawa, 2011 .

Subwavelength optical lithography

Tsuneo Terasawa, 2000 .

KrF excimer laser lithography with a phase-shifting mask for gigabit-scale ultra large scale integration

Tsuneo Terasawa, Norio Hasegawa, Shinji Okazaki, 1996 .

Demonstrating 30-nm spatial resolution of three-multilayer-mirror objective for extreme ultraviolet microscopy: Imaging test by observing lithography mask

Tsuneo Terasawa, Tsuyoshi Amano, Hiroo Kinoshita, 2014 .

Theoretical Calculation of Mask Error Enhancement Factor for Periodic Pattern Imaging

Tsuneo Terasawa, Norio Hasegawa, 2000 .

Analysis of Nonplanar Topography Effects of Phase Shift Masks on Imaging Characteristics

Tsuneo Terasawa, Norio Hasegawa, Shinji Okazaki, 1995 .

Effects of Molecular-Weight Distributions of Resist Polymers and Process Control on Lithography for 0.1μm and Below

Tsuneo Terasawa, Shinji Okazaki, Hiroshi Shiraishi, 1997 .

Height Measurement Using High-Precision Atomic Force Microscope Scanner Combined with Laser Interferometers

Tsuneo Terasawa, Satoshi Gonda, Sumio Hosaka, 2006 .

Phase Retrieval from Defocused Images and Its Applications in Lithography

Tsuneo Terasawa, Hiroshi Fukuda, Rudolf M. von Bunau, 1997 .

Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2013 .

Evaluation of EUVL-mask pattern defect inspection using 199-nm inspection optics

Yasushi Nishiyama, Osamu Suga, Tsuneo Terasawa, 2007 .

Acid‐diffusion suppression in chemical amplification resists by controlling acid‐diffusion channels in base matrix polymers

Tsuneo Terasawa, Shinji Okazaki, Hiroshi Shiraishi, 1996 .

Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability

Tsuneo Terasawa, Tsuyoshi Amano, Takeshi Yamane, 2013 .

Contrast improvement of alignment signals from resist coated patterns

Tsuneo Terasawa, Takeshi Kimura, Toshiei Kurosaki, 1987 .

Identification of residual-type defect on extreme ultraviolet mask by projection electron microscope using Monte Carlo simulation

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2012 .

Residual-type mask defect printability for extreme ultraviolet lithography

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2012 .