Jonggul Doh

Stochastic resist patterning simulation using attenuated PSM for EUV lithography

Jae Uk Lee, Seongchul Hong, Seejun Jeong, 2013, Advanced Lithography.

Required mask specification for mass production devices below 65-nm design node

Seong-Woon Choi, Woo-Sung Han, Soo-Han Choi, 2006, SPIE Photomask Technology.

Study for compensation of unexpected image placement error caused by VSB mask writer deflector

Han-Ku Cho, Min-kyu Choi, Seong-Yong Moon, 2012, Photomask Technology.

Study of the beam blur and its effect on the future mask fabrication

Seong-Woon Choi, Woo-Sung Han, Jonggul Doh, 2006, SPIE Photomask Technology.

Requirements of data technology for EUV photomask

Jonggul Doh, Chan-Uk Jeon, Jin Choi, 2019, Photomask Technology.

Printability and inspectability of defects on EUV blank for 2xnm hp HVM application

Sungmin Huh, Jihoon Na, Jonggul Doh, 2012, Advanced Lithography.