Oliver Kirch

Comparison of resist outgassing at wavelengths from 193 nm to 13 nm

Wolf-Dieter Domke, Karl Kragler, Klaus Lowack, 2005, SPIE Advanced Lithography.

Line edge roughness investigation on chemically amplified resist materials with masked Helium ion beam lithography

Evangelos Gogolides, Hans Loeschner, George P. Patsis, 2004 .