Xuelong Shi

发表

Investigation of phase variation impact on CPL PSM for low k1 imaging

Stephen D. Hsu, Douglas J. Van Den Broeke, Chun-hung Lin, 2003, Photomask Japan.

Contact hole reticle optimization by using interference mapping lithography (IML)

Will Conley, J. Fung Chen, Stephen D. Hsu, 2004, SPIE Advanced Lithography.

Studying photoresist type for sub-32nm node dense SRAM 2nd GT layer

Chang Liu, Yao Xu, Qiang Wu, 2011 .

Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology

Stephen Hsu, Robert Socha, Michael Hsu, 2005, Photomask Japan.

RET masks for patterning 45nm node contact hole using ArF immersion lithography

Jason Shieh, Stephen Hsu, J. Fung Chen, 2006, Photomask Japan.

RET integration of CPL technology for random logic

Will Conley, J. Fung Chen, Stephen D. Hsu, 2004, SPIE Advanced Lithography.

Extending aggressive low-k1 design rule requirements for 90 and 65 nm nodes via simultaneous optimization of numerical aperture, illumination and optical proximity correction

Stephen Hsu, Robert John Socha, Ting Chen, 2005 .

Limitation of Layout Correction on Improvement of OPC Model Calibration

Chunshan Du, Feng Shao, Qingwei Liu, 2013 .

A proposal for the contact hole assist feature printing checker in IML

Jason Shieh, Alek C. Chen, Robert John Socha, 2005, Photomask Japan.

Understanding the forbidden pitch and assist feature placement

Xuelong Shi, Stephen Hsu, J. Fung Chen, 2002, SPIE Photomask Technology.

Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL)

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, SPIE Advanced Lithography.

Implementation of random contact hole design with CPL mask by using IML technology

Linda Yu, Stephen Hsu, J. Fung Chen, 2005, SPIE Photomask Technology.

Study of dry etching pattern profile of chromeless phase lithography (CPL) mask

J. Fung Chen, Stephen D. Hsu, Douglas J. Van Den Broeke, 2003, SPIE Photomask Technology.

Resolution enhancement with high-transmission attenuating phase-shift masks

Will Conley, John S. Petersen, Robert J. Socha, 1999, Photomask and Next Generation Lithography Mask Technology.

Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC

Ting Chen, Stephen D. Hsu, Robert J. Socha, 2004, SPIE Advanced Lithography.

Experimental study of line-end shortening

Bo Su, Xuelong Shi, Will Conley, 1999, Advanced Lithography.

Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)

Robert Socha, Stephen D. Hsu, Douglas J. Van Den Broeke, 2003, SPIE Photomask Technology.

RET masks for the final frontier of optical lithography

Jungchul Park, Sangbong Park, Ting Chen, 2005, Photomask Japan.

Double dipole lithography for 65-nm node and beyond: a technology readiness review

Tsann-Bim Chiou, Jo Finders, Eric Hendrickx, 2004, Photomask Japan.

Optimizing and enhancing optical systems to meet the low k1 challenge

Jo Finders, Oscar Noordman, Jan Baselmans, 2003, SPIE Advanced Lithography.

Shape control using sidewall imaging

Xuelong Shi, Mina Menaker, Bo Su, 2000, Advanced Lithography.

Study on overlay AEI-ADI shift on contact layer of advanced technology node

Qiang Zhang, Qiang Wu, Xuelong Shi, 2016, SPIE Advanced Lithography.

Study on abnormal intra-field CD uniformity induced by Efese-tilt application upon complex leveling scheme

Xin Yao, Qiang Wu, Xuelong Shi, 2014, Advanced Lithography.

Eigen-decomposition-based models for model OPC

J. Fung Chen, Stephen D. Hsu, Douglas J. Van Den Broeke, 2004, Photomask Japan.

Reticle defect printability for sub-0.3k1 chromeless phase lithography (CPL) technology

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Japan.

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results

Will Conley, Christophe Pierrat, Robert John Socha, 1999, Advanced Lithography.

Optimal feature vector design for computational lithography

Wei Yuan, Yanjun Xiao, Ming Li, 2019, Advanced Lithography.

Understanding the impact of full-field mask error factor

Will Conley, Mircea Dusa, Robert John Socha, 2000, Advanced Lithography.

Simultaneous source mask optimization (SMO)

Robert Socha, Xuelong Shi, David LeHoty, 2005, Photomask Japan.

Impact of attenuated PSM repair for 130-nm polygate lithography process

Will Conley, David Wang, Henry Lin, 2001, SPIE Advanced Lithography.

The Effects of Nominal Process Focus Definition on the OPC Model

Qingwei Liu, Yu Zhu, Xuelong Shi, 2012 .

Tuning MEEF for CD control at 65nm node based on Chromeless Phase Lithography (CPL)

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Technology.

Contact hole reticle optimization by using interference mapping lithography (IML)

Stephen D. Hsu, Robert J. Socha, Douglas J. Van Den Broeke, 2004, Photomask Japan.

RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography

Stephen Hsu, Xuelong Shi, J. Fung Chen, 2001, Photomask Japan.

Full-chip manufacturing reliability check and correction (MRC2): a first step toward design for manufacturability with low k1 lithography

Stephen Hsu, J. Fung Chen, Michael Hsu, 2004, SPIE Photomask Technology.

Role of acid charge in chemically amplified resists

Xuelong Shi, 1999, Advanced Lithography.

The Mask 3D Effect on 2D Pattern Shape Fidelity, a Simulation Study

Qiang Wu, Xuelong Shi, Wanjuan Zhang, 2014 .

Lithography manufacturing implementation for 65 nm and 45 nm nodes with model-based scattering bars using IML technology

Stephen Hsu, Robert Socha, Michael Hsu, 2004, SPIE Advanced Lithography.

OPC model calibration for CPL patterning at extreme low k1

Linda Yu, Stephen Hsu, J. Fung Chen, 2004, SPIE Photomask Technology.

Quantification of two-dimensional structures generalized for OPC model verification

Stephen Hsu, J. Fung Chen, Michael Hsu, 2007, SPIE Advanced Lithography.

65-nm full-chip implementation using double dipole lithography

Will Conley, Tsann-Bim Chiou, Jo Finders, 2003, SPIE Advanced Lithography.

Understanding the forbidden pitch phenomenon and assist feature placement

Stephen Hsu, Mircea Dusa, Robert John Socha, 2002, SPIE Advanced Lithography.

Low k1 lithography patterning option for the 90-nm and 65-nm nodes

J. Fung Chen, Stephen D. Hsu, Douglas J. Van Den Broeke, 2003, Photomask Japan.

Dual damascene photo process using negative-tone resist

Will Conley, Stephen Hsu, Robert J. Socha, 2000, Advanced Lithography.

Contact and via hole mask design optimization for 65-nm technology node

Stephen Hsu, Robert Socha, J. Fung Chen, 2004, SPIE Photomask Technology.

Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node

J. Fung Chen, Stephen D. Hsu, Robert J. Socha, 2004, Photomask Japan.

OPC Model Calibration Accuracy Improvement by Using Mask 3D Model

Xuelong Shi, Yingchun Zhang, Qingwei Liu, 2014 .

Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL

J. Fung Chen, Stephen D. Hsu, Douglas J. Van Den Broeke, 2004, Photomask Japan.

Phase defect repair for the chromeless phase lithography (CPL) mask

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Technology.

Study on ADI CD bias correlating ABC function

Qiang Zhang, Qiang Wu, Gaorong Li, 2015, Advanced Lithography.

Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond

Stephen Hsu, Jo Finders, Robert John Socha, 2002, SPIE Advanced Lithography.

Impact on OPC treatment accuracy due to illumination pupil shape deviation for 110-nm target CD

Stephen Hsu, Steven G. Hansen, Xuelong Shi, 2002, SPIE Advanced Lithography.

Lithography process optimization for 130-nm polygate mask and the impact of mask error factor

Stephen Hsu, Robert John Socha, Xuelong Shi, 2001, SPIE Advanced Lithography.

Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Japan.

Mesa or Trench Type for Chromeless Phase-shift Lithography From Photolithographic Performance Point of View

Stephen Hsu, J. Fung Chen, Robert J. Socha, 2002, Photomask Technology.

Machine learning virtual SEM metrology and SEM-based OPC model methodology

Xuelong Shi, Yan Yan, Wei Yuan, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models

Chen Shoumian, Zhao Yuhang, Xuelong Shi, 2021 .

Design of 200nm, 170nm, 140nm DUV contact sweeper high transmission attenuating phase shift mask : Experimental results Part 2

Will Conley, Bo Su, Fung Chen, 1999 .