J. Fung Chen

发表

Investigation of phase variation impact on CPL PSM for low k1 imaging

Stephen D. Hsu, Douglas J. Van Den Broeke, Chun-hung Lin, 2003, Photomask Japan.

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I

Robert John Socha, John S. Petersen, J. Fung Chen, 1998, Photomask Technology.

Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)

John S. Petersen, Stephen Hsu, Robert J. Socha, 2002, SPIE Advanced Lithography.

Extending aggressive low-k1 design rule requirements for 90 and 65 nm nodes via simultaneous optimization of numerical aperture, illumination and optical proximity correction

Stephen Hsu, Robert John Socha, Ting Chen, 2005 .

Resolution enhancement with high-transmission attenuating phase-shift masks

Will Conley, John S. Petersen, Robert J. Socha, 1999, Photomask and Next Generation Lithography Mask Technology.

Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)

Robert Socha, Stephen D. Hsu, Douglas J. Van Den Broeke, 2003, SPIE Photomask Technology.

Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections

Yuri Granik, Uwe Hollerbach, Robert John Socha, 2000 .

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results

Will Conley, Christophe Pierrat, Robert John Socha, 1999, Advanced Lithography.

Development of mask-making process for CLM manufacturing technology

Dong-Hoon Chung, Seong-Woon Choi, Jung-Min Sohn, 2002, Photomask Japan.

Impact of attenuated PSM repair for 130-nm polygate lithography process

Will Conley, David Wang, Henry Lin, 2001, SPIE Advanced Lithography.

Contact hole reticle optimization by using interference mapping lithography (IML)

Stephen D. Hsu, Robert J. Socha, Douglas J. Van Den Broeke, 2004, Photomask Japan.

RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography

Stephen Hsu, Xuelong Shi, J. Fung Chen, 2001, Photomask Japan.

Pattern measurements of reticles with optical proximity correction assist features using the atomic force microscope

Kuo-Jen Chao, Robert J. Plano, Jeffrey R. Kingsley, 1999, Advanced Lithography.

Hopkins versus Abbe': a lithography simulation matching study

J. Fung Chen, Armin Liebchen, Ralph E. Schlief, 2002, SPIE Advanced Lithography.

Crossing the divide between lithography and chip design

William H. Arnold, J. Fung Chen, Kurt E. Wampler, 2002, SPIE Advanced Lithography.

An OPC technology roadmap to 0.14μm design rules

J. Fung Chen, Kurt E. Wampler, Roger F. Caldwell, 1998 .

Understanding the forbidden pitch phenomenon and assist feature placement

Stephen Hsu, Mircea Dusa, Robert John Socha, 2002, SPIE Advanced Lithography.

Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Will Conley, John S. Petersen, David J. Gerold, 2002, SPIE Advanced Lithography.

CPL reticle technology for advanced device applications

Kevin D. Lucas, Philippe Thony, Christopher J. Progler, 2004, Photomask Japan.

Development of a computational lithography roadmap

Yu Cao, Robert John Socha, J. Fung Chen, 2008, SPIE Advanced Lithography.

Effects of off-axis illumination and scattering-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask: a simulation study

Uwe Hollerbach, Kent H. Nakagawa, J. Fung Chen, 2000, Advanced Lithography.

Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond

Stephen Hsu, Jo Finders, Robert John Socha, 2002, SPIE Advanced Lithography.

Design and analysis of across-chip linewidth variation for printed features at 130 nm and below

Greg Yeric, Robert John Socha, Mircea Dusa, 2000, Advanced Lithography.

Impact on OPC treatment accuracy due to illumination pupil shape deviation for 110-nm target CD

Stephen Hsu, Steven G. Hansen, Xuelong Shi, 2002, SPIE Advanced Lithography.

Lithography process optimization for 130-nm polygate mask and the impact of mask error factor

Stephen Hsu, Robert John Socha, Xuelong Shi, 2001, SPIE Advanced Lithography.

Practical technology path to sub-0.10-μm process generations via enhanced optical lithography

Kent H. Nakagawa, J. Fung Chen, Thomas Laidig, 1999, Photomask Technology.

Investigation of model OPC optimization based on CD uniformity yield

Uwe Hollerbach, J. Fung Chen, Thomas Laidig, 2003, SPIE Advanced Lithography.