Heiner Ryssel

发表

Improvements in simulation of 2D implantation profiles

Heiner Ryssel, L. Gong, Jürgen Lorenz, 1989, International Symposium on VLSI Technology, Systems and Applications,.

Three-dimensional simulation of ion implantation

Heiner Ryssel, Jürgen Lorenz, K. Tietzel, 1996, 1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095).

Design and sensitivity optimization of vibration sensors for tool-state monitoring

Heiner Ryssel, Jochen S. Thomas, Ralf Kuehnhold, 1999, Design, Test, Integration, and Packaging of MEMS/MOEMS.

Quantum Mechanical Studies of Boron Clustering in Silicon

Heiner Ryssel, Peter Pichler, Peter Deakl, 2006, High Performance Computing in Science and Engineering.

A silicon vibration sensor for tool state monitoring working in the high acceleration range

Heiner Ryssel, J. Thomas, R. Kühnhold, 2000 .

Monte Carlo simulation of silicon amorphization during ion implantation

Siegfried Selberherr, Heiner Ryssel, Jürgen Lorenz, 1996, 1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095).

Creation of E-learning content for microelectronics manufacturing

Cian O'Murchu, Ludger Krahn, Heiner Ryssel, 2006 .

Silicon to silicon direct bonding-characterization of the interface and manufacture of p-i-n diodes

Heiner Ryssel, E. P. Burte, R. Wiget, 2002 .

Three-dimensional simulation of layer deposition

Jürgen Lorenz, Heiner Ryssel, E. Bär, 1998 .

Optoelectronic Emitters: physical principles, devices and applications Indo-German Winter Academy 2010

Heiner Ryssel, Indrasen Bhattacharya, 2010 .

FLYING WAFER - A STANDARDISED METHODOLOGY FOR MULTI-SITE PROCESSING OF 300 MM WAFERS AT R&D-SITES

C. Claeys, Heiner Ryssel, A. Danel, 2006 .

Atomistic Evaluation of Diffusion Theories for the Diffusion of Dopants in Vacancy Gradients

Heiner Ryssel, S. List, P. Pichler, 1995 .

Simulation of semiconductor devices and processes, vol. 6

Heiner Ryssel, Processes, Peter Pichler, 1993 .

Direct experimental evidence for diffusion of dopants via pairs with intrinsic point defects

Heiner Ryssel, Peter Pichler, P. Pichler, 1992 .

Reflection approach for the analytical description of light ion implantation into bilayer structures

Heiner Ryssel, Jürgen Lorenz, R. J. Wierzbicki, 1994 .

Aerosol synthesis of silicon nanoparticles with narrow size distribution—Part 1: Experimental investigations

Michael P. M. Jank, Heiner Ryssel, Wolfgang Peukert, 2010 .

Determination of aluminum diffusion parameters in silicon

Heiner Ryssel, Peter Pichler, P. Pichler, 2002 .

Ion implantation into non-planar targets: Monto Carlo simulations and analytical models

Heiner Ryssel, Jürgen Lorenz, H. Ryssel, 1987 .

Modeling the pH response of silicon nitride ISFET devices

Heiner Ryssel, H. Ryssel, R. Kühnhold, 2000 .

Investigations on the topology of structures milled and etched by focused ion beams

Lothar Frey, Heiner Ryssel, S. Lipp, 1996 .

UV nanoimprint materials: Surface energies, residual layers, and imprint quality

Mathias Rommel, Lothar Frey, Heiner Ryssel, 2007 .

Electrical characterization and reliability aspects of Zirconium Silicate films obtained from novel MOCVD precursors

Lothar Frey, Heiner Ryssel, Albena Paskaleva, 2004 .

A comparison of focused ion beam and electron beam induced deposition processes

Heiner Ryssel, L. Frey, S. Pauthner, 1996 .

Field-Effect transistors as transducers in biosensors for substrates of dehydrogenases†

Jiri Janata, Thomas Mikolajick, Heiner Ryssel, 1994 .

Effective work function tuning in high-κ dielectric metal-oxide-semiconductor stacks by fluorine and lanthanide doping

Lothar Frey, Heiner Ryssel, Anton J. Bauer, 2010 .

Ellipsometric study of polycrystalline silicon films prepared by low-pressure chemical vapor deposition

P. Petrik, Heiner Ryssel, Miklos Fried, 2000 .

The influence of surface oxidation on the pH-sensing properties of silicon nitride

Thomas Mikolajick, Heiner Ryssel, R Schnupp, 1999 .

Reliability of ultra-thin N2O-nitrided oxides grown by RTP under low pressure and in different gas atmospheres

Heiner Ryssel, Anton J. Bauer, M. Beichele, 2000 .

Reliability and Degradation of Metal-Oxide-Semiconductor Capacitors on 4H- and 6H-Silicon Carbide

Peter Friedrichs, Heiner Ryssel, Roland Rupp, 2000 .

Zirconium silicate films obtained from novel MOCVD precursors

Lothar Frey, Heiner Ryssel, Albena Paskaleva, 2003 .

Models for implantation into multilayer targets

Heiner Ryssel, Jürgen Lorenz, H. Ryssel, 1986 .

Model for the electronic stopping of channeled ions in silicon around the stopping power maximum

Lothar Frey, Heiner Ryssel, G. Hobler, 1995 .

Analytical modeling of lateral implantation profiles

Heiner Ryssel, Jürgen Lorenz, R. J. Wierzbicki, 1995 .

Reducing airborne molecular contamination by efficient purging of FOUPs for 300-mm wafers-the influence of materials properties

Heiner Ryssel, Lothar Pfitzner, J. Frickinger, 2000 .

Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics

Tobias Erlbacher, Mathias Rommel, Heiner Ryssel, 2008 .

Improved tribological properties of sputtered MoSx films by ion beam mixing

Heiner Ryssel, Hubertus Hübsch, K. Kobs, 1986 .

Analytical Model for Phosphorus Large Angle Tilted Implantation

Siegfried Selberherr, Heiner Ryssel, Jürgen Lorenz, 1995 .

Ion-beam-assisted deposition and ion beam synthesis of wear resistant coatings on technical surfaces

Heiner Ryssel, Andreas Kluge, H. Ryssel, 1992 .

Polymer bonded soft magnetic particles for planar inductive devices

Heiner Ryssel, Sven Egelkraut, Martin Maerz, 2008 .

Distribution and segregation of arsenic at the SiO2/Si interface

Heiner Ryssel, Peter Pichler, Wolfgang Windl, 2008 .

Electrical Characterization of MOS Structures with Deposited Oxides Annealed in N2O or NO

Peter Friedrichs, Tsunenobu Kimoto, Heiner Ryssel, 2009 .

Comparison of the Threshold-Voltage Stability of SiC MOSFETs with Thermally Grown and Deposited Gate Oxides

Peter Friedrichs, Tsunenobu Kimoto, Heiner Ryssel, 2010 .

Ion Implantation Techniques

Heiner Ryssel, H. Ryssel, H. Glawischnig, 1982 .

The pH-sensing properties of tantalum pentoxide films fabricated by metal organic low pressure chemical vapor deposition

Thomas Mikolajick, Heiner Ryssel, R. Kühnhold, 1997 .

Impact of interface variations on J-V and C-V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1-x)AlxO2 films

Heiner Ryssel, Anton J. Bauer, Uwe Schröder, 2009 .

Dielectric layers suitable for high voltage integrated trench capacitors

Lothar Frey, Heiner Ryssel, Anton J. Bauer, 2011 .

Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode

Heiner Ryssel, Anton J. Bauer, M. Herden, 2001 .