Guanyang Lin

发表

Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Lieve Van Look, Yi Cao, Hari Pathangi, 2015, Advanced Lithography.

Impact of BCP asymmetry on DSA patterning performance

Yi Cao, Roel Gronheid, Guanyang Lin, 2015, Advanced Lithography.

Novel metrology methods for fast 3D characterization of directed self-assembly (DSA) patterns for high volume manufacturing

Benjamin Bunday, Guanyang Lin, Ted Dziura, 2014, Advanced Lithography.

Implementation of DSA for electrical test vehicles at the 7 nm node

Geert Vandenberghe, Julien Ryckaert, Roel Gronheid, 2015 .

Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Lieve Van Look, Yi Cao, Hari Pathangi, 2014, Advanced Lithography.

PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

Sang-Ho Lee, Munirathna Padmanaban, Ralph R. Dammel, 2004, SPIE Advanced Lithography.

EUV underlayer materials for 22nm HP and beyond

Jianhui Shan, Mark Neisser, Guanyang Lin, 2011, Advanced Lithography.

DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC

Yi Cao, Kaushik Sah, Andrew Cross, 2016, SPIE Advanced Lithography.

Versatility in lithographic performance of advanced 193 nm contact hole resist

John J. Biafore, Munirathna Padmanaban, Ralph R. Dammel, 2006, SPIE Advanced Lithography.

Directed self-assembly materials for high resolution beyond PS-b-PMMA

Edward Ng, Jianhui Shan, Yi Cao, 2016, SPIE Advanced Lithography.

Tuning the strength of chemical patterns for directed self-assembly of block copolymers

Yi Cao, Roel Gronheid, Guanyang Lin, 2014, Advanced Lithography.

Influence of template fill in graphoepitaxy directed self-assembly

Roel Gronheid, Boon Teik Chan, Guanyang Lin, 2016 .

Performance of a dry 193nm resist under wet conditions

Munirathna Padmanaban, Ralph R. Dammel, Dalil Rahman, 2006, SPIE Advanced Lithography.

Bottom anti-reflective coating for hyper NA process: theory, application and material development

Mark Neisser, Ralph R. Dammel, Guanyang Lin, 2008, Lithography Asia.

Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration

Yi Cao, Roel Gronheid, Kathleen Nafus, 2013, Advanced Lithography.

Toward high-performance quality meeting IC device manufacturing requirements with AZ SMART DSA process

Jianhui Shan, Hengpeng Wu, Yi Cao, 2015, Advanced Lithography.

Implementation of templated DSA for via layer patterning at the 7nm node

Geert Vandenberghe, Germain Fenger, Julien Ryckaert, 2015, Advanced Lithography.

Novel diamantane polymer platform for enhanced etch resistance

Munirathna Padmanaban, Ralph R. Dammel, Takanori Kudo, 2007, SPIE Advanced Lithography.

High-etch-rate low-bias bow outgassing BARC via-filling materials for 193-nm ArF lithographic process

Jianhui Shan, Mark Neisser, Guanyang Lin, 2008, SPIE Advanced Lithography.

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Yi Cao, Hari Pathangi, Roel Gronheid, 2015 .

193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

Munirathna Padmanaban, Takanori Kudo, M. Dalil Rahman, 2006, SPIE Advanced Lithography.

Advanced CD-SEM metrology for pattern roughness and local placement of lamellar DSA

Hiroshi Yoshida, Takeshi Kato, Yi Cao, 2014, Advanced Lithography.

The role of guide stripe chemistry in block copolymer directed self-assembly

Roel Gronheid, Guanyang Lin, Jihoon Kim, 2015, Advanced Lithography.

Influence of template fill in graphoepitaxy DSA

Joost Bekaert, Boon Teik Chan, Guanyang Lin, 2016, SPIE Advanced Lithography.

Using chemo-epitaxial directed self-assembly for repair and frequency multiplication of EUVL contact-hole patterns

Yi Cao, Roel Gronheid, Boon Teik Chan, 2014, Advanced Lithography.

Process optimization of templated DSA flows

Yi Cao, Roel Gronheid, Joost Bekaert, 2014, Advanced Lithography.

The SMARTTM Process for Directed Block Co-Polymer Self-Assembly

Jian Yin, Jianhui Shan, Hengpeng Wu, 2013 .

Development of Spin-on High Carbon Hard Masks for High Resolution Photolithography

Guanyang Lin, Douglas Mckenzie, M. Dalil Rahman, 2011 .

The SMART TM Process for Directed Block CoPolymer Self-Assembly

Jian Yin, Jianhui Shan, Hengpeng Wu, 2013 .

Contact Hole Resist Solutions for 45-90nm Node Design Rules

Yusuke Takano, Guanyang Lin, SungEun Hong, 2004 .

Implementation of surface energy modification in graphoepitaxy directed self-assembly for hole multiplication

Yi Cao, Roel Gronheid, Joost Bekaert, 2015 .

The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography.

Lei Wan, Jian Yin, Yi Cao, 2015, ACS nano.

Geometric Control of Chemically Nano-patterned Substrates for Feature Multiplication Using Directed Self-Assembly of Block Copolymers

Hengpeng Wu, Yi Cao, Roel Gronheid, 2012 .

High Throughput Grating Qualification for Rating Directed Self-Assembly Pattern Performance using Optical Metrology

Ivan Pollentier, Roel Gronheid, Guanyang Lin, 2013 .

Directed Self-assembly of Topcoat-free, Integration-friendly High-χ Block Copolymers

Joy Cheng, Guanyang Lin, Daniel P. Sanders, 2014 .