Loren W. Linholm

Electrical test structures replicated in silicon-on-insulator material

Richard A. Allen, John S. Villarrubia, Michael W. Cresswell, 1996, Advanced Lithography.

CD Reference Materials for Sub-Tenth Micrometer Applications

Richard A. Allen, Marylyn Hoy Bennett, Michael W. Cresswell, 2002 .

Comparison of sheet-resistance measurements obtained by standard and small-area four-point probing

Loren W. Linholm, M. W. Cresswell, R. A. Allen, 1999, ICMTS 1999. Proceedings of 1999 International Conference on Microelectronic Test Structures (Cat. No.99CH36307).

Comparisons of measured linewidths of submicrometer lines using optical, electrical, and SEM metrologies

Richard A. Allen, Loren W. Linholm, Patrick M. Troccolo, 1993, Advanced Lithography.

Microelectronic test structures for feature placement and electrical linewidth metrology

Richard A. Allen, Michael W. Cresswell, Loren W. Linholm, 1994, Advanced Lithography.

CD reference materials for sub-10th μm applications

Richard A. Allen, Michael W. Cresswell, Loren W. Linholm, 2002, SPIE Advanced Lithography.

Technology Transfer at NIST

Herbert S. Bennett, Loren W. Linholm, Thomas J. Russell, 1989 .

The Design Guide for Cmos-on-Simox Test Chips Nist3 and Nist4

Mona E. Zaghloul, Loren W. Linholm, C. H. Ellenwood, 2017 .