T. Wallow

EUV resist performance: current assessment for sub-22-nm half-pitch patterning on NXE:3300

T. Wallow, D. Civay, S. Wang, 2012, Advanced Lithography.

Initial experience establishing an EUV baseline lithography process for manufacturability assessment

J. Hartley, O. R. Wood, G. Denbeaux, 2007, SPIE Advanced Lithography.

7nm node EUV predictive study of mask LER transference to wafer

P. Brooker, T. Wallow, D. Civay, 2013, Advanced Lithography.

Deconstructing contact hole CD printing variability in EUV lithography

T. Wallow, D. Civay, P. Mangat, 2014, Advanced Lithography.

Post-etch LER performance of novel surface conditioner solutions

T. Wallow, R. H. Kim, M. Jaramillo, 2006, SPIE Advanced Lithography.