S. Wang

EUV resist performance: current assessment for sub-22-nm half-pitch patterning on NXE:3300

T. Wallow, D. Civay, S. Wang, 2012, Advanced Lithography.

Investigation of processing performance and requirements for next generation lithography cluster tools

S. Wang, C. Verspaget, R. Maas, 2011, Advanced Lithography.

A dive into clear water: immersion defect capabilities

S. Wang, Y. van Dommelen, R. Moerman, 2006, SPIE Advanced Lithography.

Process manufacturability evaluation for next generation immersion technology node

T. Shibata, S. Wang, R. Maas, 2008, SPIE Advanced Lithography.

Evaluation of next generation hardware for lithography processing

S. Wang, C. Verspaget, R. Maas, 2010, Advanced Lithography.